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Nanoporous Materials from Block Copolymer Precursors

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Block Copolymers II

Part of the book series: Advances in Polymer Science ((POLYMER,volume 190))

Abstract

Block copolymers constitute a fascinating set of self-assembled materials exhibiting compositional heterogeneities on the nanometer length scale. While traditionally employed as thermoplastic elastomers, asphalt modifiers, and adhesives, the potential of self-assembled block copolymers for nanotechnological applications has been realized in the past decade and many examples have now appeared in the literature. As indicated by the title, this review covers a specific aspect of block copolymers as tools for preparing nanoscopic materials. Nanoporous materials can be generated by selective removal of one component from a self-assembled block copolymer. These materials exhibit the pore size and pore topology of their parent structures and can be used as nanolithographic masks, separation membranes and nanomaterial templates. The work described within covers the published work in the field since the first report of nanoporous materials from ordered block copolymers nearly two decades ago. After an introductory section and historical account, sections on nanolithography, membranes, monoliths, and templates follow. The review ends with a summary and outlook on this exciting research arena in block copolymer science and technology.

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Abbreviations

AFM:

atomic force microscopy

DBS:

dodecylbenzenesulfonate

BET:

Brunauer--Emmett--Teller

χ:

Flory--Huggins interaction parameter

GASAXS:

Grazing angle small-angle X-ray scattering

HABA:

2-(4′-hydroxybenzene-azo)benzoic acid

IR:

infrared

NMR:

nuclear magnetic resonance

PαMS:

poly(α-methyl styrene)

PBD:

polybutadiene

PCEMA:

poly(2-cinnamoylethyl methacrylate)

PCHE:

polycyclohexylethylene

PDP:

pentadecyl phenol

PDMS:

polydimethylsiloxane

PEO:

poly(ethylene oxide)

PFMA:

poly(perfluorooctylethyl methacrylate)

PHOST:

poly(4-hydroxy styrene)

PI:

polyisoprene

PLA:

polylactide

PLLA:

poly-L-lactide

PMMA:

poly(methyl methacrylate)

PPO:

poly(propylene oxide)

P(PMDSS):

poly(pentamethyldisilylstyrene)

PPS:

poly(4-vinylphenyl-dimethyl-2-propoxysilane)

PS:

polystyrene

PVP:

poly-4-vinylpyridine

PtBA:

poly(t-butylacrylate)

RIE:

reactive ion etching

SANS:

small-angle neutron scattering

SAXS:

small-angle X-ray scattering

scCO2 :

super critical carbon dioxide

SEC:

size exclusion chromatography

SEM:

scanning electron microscopy

TBAF:

tetrabutyl ammonium fluoride

TEM:

transmission electron microscopy

T g :

glass transition temperature

THF:

tetrahydrofuran

UV:

ultraviolet

WAXS:

wide-angle X-ray scattering

XPS:

X-ray photoelectron spectroscopy

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Acknowledgments

First and foremost I thank the students and postdocs in my group that have contributed to our nanoporous material efforts. The enthusiasm, dedication, and productivity of Andrew Zalusky, Roberto-Olayo Valles, Seongho Cho, Johanna Wolf, Huiming Mao, Bret Johnson, Travis Bailey, Shouwu Guo, Pedro Arrechea, and Javid Rzayev are all greatly appreciated. Particular thanks goes to Andrew and Roberto for their important contributions to this review. Volker Abetz, Koji Asakawa, Julie Leiston-Belanger, Guojun Liu, Huiming Mao, Seiichi Nakahama, Christopher Ober, and Thomas Russell are gratefully acknowledged for providing helpful comments and suggestions while this manuscript was in review. The nanoporous materials work in my group has been funded by The University of Minnesota, The National Science Foundation (DMR-0094144), The David and Lucile Packard Foundation, and the Camille and Henry Dreyfus Foundation, and I am grateful for their support.

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  1. Department of Chemistry, University of Minnesota, 207 Pleasant St. SE, MN 55455-0431, Minneapolis, USA

    Marc A. Hillmyer

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  1. Marc A. Hillmyer
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Correspondence to Marc A. Hillmyer .

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Volker Abetz

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Hillmyer, M.A. Nanoporous Materials from Block Copolymer Precursors. In: Abetz, V. (eds) Block Copolymers II. Advances in Polymer Science, vol 190. Springer, Berlin, Heidelberg. https://doi.org/10.1007/12_002

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