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2007 | Buch

Low-Frequency Noise In Advanced Mos Devices

verfasst von: Martin von Haartman, Mikael Östling

Verlag: Springer Netherlands

Buchreihe : Analog Circuits and Signal Processing

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SUCHEN

Über dieses Buch

Low-Frequency Noise in Advanced CMOS Devices begins with an introduction to noise, describing the fundamental noise sources and basic circuit analysis. The characterization of low-frequency noise is discussed in detail and useful practical advice is given. The various theoretical and compact low-frequency (1/f) noise models in MOS transistors are treated extensively providing an in-depth understanding of the low-frequency noise mechanisms and the potential sources of the noise in MOS transistors. Advanced CMOS technology including nanometer scaled devices, strained Si, SiGe, SOI, high-k gate dielectrics, multiple gates and metal gates are discussed from a low-frequency noise point of view. Some of the most recent publications and conference presentations are included in order to give the very latest view on the topics. The book ends with an introduction to noise in analog/RF circuits and describes how the low-frequency noise can affect these circuits.

Inhaltsverzeichnis

Frontmatter
Chapter 1. Fundamental Noise Mechanisms
Martin von Haartman, Mikael Östling
Chapter 2. Noise Characterization
Martin von Haartman, Mikael Östling
Chapter 3. 1/F Noise in Mosfets
Origins and modeling
Martin von Haartman, Mikael Östling
Chapter 4. 1/f Noise Performance of Advanced Cmos Devices
Martin von Haartman, Mikael Östling
Chapter 5. Introduction to Noise in Rf/Analog Circuits
Martin von Haartman, Mikael Östling
Backmatter
Metadaten
Titel
Low-Frequency Noise In Advanced Mos Devices
verfasst von
Martin von Haartman
Mikael Östling
Copyright-Jahr
2007
Verlag
Springer Netherlands
Electronic ISBN
978-1-4020-5910-0
Print ISBN
978-1-4020-5909-4
DOI
https://doi.org/10.1007/978-1-4020-5910-0

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