Abstract
A large number of different deposition techniques are used for the production of thin films for optical applications, as outlined in chapter ‘Thin Film Deposition Techniques’ by H. K. Pulker. The two most important categories are physical vapour deposition (PVD), namely thermal vaporisation and sputtering, and chemical vapour deposition (CVD). It is obvious, that for each deposition technique suitable coating materials are required.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Albertinetti N, Minden HAT (1996) Granularity in ion-beam-sputtered Ti02 films. Appl. Opt 35: 5620–5625
Alvisi M, De Nuncio G, Di Gulio M, Ferrara MC, Perrone MR, Protopapa L, Vasanelli L (1999) Deposition of Si02 films with high laser damage thresholds by ion-assisted electron-beam evaporation. Appl. Opt. 38: 1237–1243
Anderson O, Ottermann C (1997) Silicon oxides. In: Bach H, Krause D (eds) Thin films on glass. Springer, Berlin Heidelberg, pp 161–173
Anderson O, Bange K, Ottermann C (1997) Titanium oxide. In Bach H, Krause D (eds) Thin films on glass. Springer, Berlin Heidelberg, pp 137–161
Andre P, Poupinet L, Ravel G (2000) Evaporation and ion assisted deposition of Hf02 coatings: Some key points for high power applications. J. Vac. Sci. Technol. A 18: 2372–2377
Balzers Patent- und Beteiligungs-AG (1967) Lichtabsorbierendes Sonnenbrillenglas. Schweizer Patent 447 476
Bange K (1997) Properties and characterisation of dielectric thin films. In: Bach H, Krause D (eds) Thin films on glass. Springer, Berlin Heidelberg, pp 101–225
Bendavid A, Martin PJ, Takikawa H (2000) Deposition and modification of titanium dioxide films by filtered arc deposition. Thin Solid films 360: 241–249
Bennett JM, Pelletier E, Albrand G, Borgogno JP, Lazarides B, Carniglia CK, Schmell RA, Allen TH, Tuttle-Hart T, Guenther KH, Saxer A (1989) Comparison of the properties of titanium dioxide films prepared by various techniques. Appl. Opt. 28: 3303–3317
Bernitzki H, Lauth H, Thielsch R, Blaschke H, Kaiser N, Mann K (1999) Current status of radiation resistance of dielectric mirrors in the DUV. SPIE 3578
Bin F, Zhang F (1997) Study on optical properties of PbTe and ZnSe at low temperature. J. of Shanghai Jiaotong Univ. 31: 69–71
Brunet-Bruneau A, Vuye G, Frigerio JM, Abeles F, Rivory J, Berger M, Chaton P (1996) Infrared ellipsometry investigation of SiOxNy thin films on silicon. Appl. Opt. 35: 4998–5004
Canon Kabushiki Kaisha (1976) Three layer antireflection film US Pat. 3 934 961
Chen JS, Chao S, Kao JS, Lai GR, Wang WH (1997) Substrate-dependent optical absorption characteristics of titanium dioxide thin films. Appl. Opt. 36: 4403–4408
Cho HJ, Hwangbo CK (1996) Optical inhomogeneity and microstructure of Zr02 thin films prepared by ion-assisted deposition. Appl. Opt. 35: 5545–5552
Cowell R (1996) Durable optical coatings for energetic UV laser sources. SPIE 2703:369–374
De CK, Misra NK, Gosh T B (1995) Preparation and structural characterisation of ZnSe thin films by x-ray diffraction technique. Indian J. Phys.,A 69A: 261–266
Dods SRA, Zhang Z, Ogura M (1999) Highly dispersive mirror in Ta205/Si02 for femtosecond lasers designed by inverse spectral theory. Appl. Opt. 38: 4711–4719
Edlinger J, Ramm J, Pulker HK (1989) Properties of ion-plated Nb2O5 films. Thin Solid Filmsl75: 207–212
Edlou SM, Smajjkiewicz A, Al-Jumaily GA (1993) Optical properties and environmental stability of oxide coatings deposited by reactive sputtering. Appl. Opt. 32: 5601–5605
Friz M, Koenig F, and Feiman S. (1992) New materials for production of optical coatings. Proc. SVC 35th Ann. Techn. Conf 1992, 143–149
Friz M, Schallenberg UB, Laux S. (1997) Plasma ion assisted deposition of medium and high refractive index thin films. Proc. SVC 40th Ann. Techn. Conf. 1997: 280–292
Ganner P (1986) Medium-Index mixed-oxide layers for use in AR-coatings. Proc. SPIE 652:69–76
Glaser HJ (1990) Dunnfilmtechnologie auf Flachglas. Verlag Karl Hoffmann, Schorndorf
Goldflnger P, Jeunehomme M (1963) Mass spectrometric and Knudsen cell vaporization studies of 2B-6A compounds. Trans. Far. Soc. 59: 2851–2867
Hawkins GJ, Hunneman R, Sherwood R, Barrett BM (2000) Infrared filters and coatings for the High Resolution Dynamics Limb Sounder (6–18 urn) Appl. Optics 39: 5221–5230
Heitmann W, Ritter E (1968) Production and properties of vacuum evaporated films of Thorium fluoride. Appl. Optics 7:307–309
Hussain Z, (1999) Vacuum temperature-dependent ellipsometric studies on W03 thin films. Appl. Opt. 38:7112–7127
Izawa T, Yamamura N, Uchimura R, Yakuoh T (1994) Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm. SPIE 2114:297–308
Klinger RE, Carniglia CK (1985) Optical and crystalline inhomogeneity in evaporated zir-conia films. Appl. Opt. 24: 3184–3187
Koenig F, Friz M (1994) Development of medium and high refractive index coating materials for the visible and UV spectral range. Proc. SVC 37th Ann. Techn. Conf. 1994: 118–121
Kolbe J, Miiller H, Schink H, Welling H, Ebert J (1990) Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters. NIST Spec. Publ. 801:404–416
Kolbe J, Kessler H, Hofmann T, Meyer F, Schink H, Ristau D (1991) Optical properties and damage thresholds of dielectric UV/VUV coatings deposited by conventional evaporation, IAD and IBS. SPIE 1624:221–235
Kraus T, Rheinberger P (1962) Use of rare earth metal in vaporizing metals and metal oxides. U.S. Patent 3 034 924
Kulkarni AK, Lim T, Khan M, Schulz KH, (1998) Electrical, optical and structural properties of indium-tin-oxide thin films deposited on polyethylene terephtalate substrates by rf sputtering. J. Vac. Sci. Technol. A 16: 1636–1640
Larruquert JI, Keski-Kuha RAM (1999) Multilayer coatings with high reflectance in the extreme-ultraviolet spectral range of 50 to 121.6 nm. Appl. Opt. 38: 1231–1236
Larruquert JI, Keski-Kuha RAM (2000) Reflectance measurements and optical constants in the extreme ultraviolet for thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr. Appl. Opt. 39: 2772–2781
Lee CC, Chen SH, Jaing CC (1996) Optical monitoring of silver-based transparent heat mirrors. Appl. Opt. 35: 5698–5703
Lee CC, Chen HL, Hsu JC, Tien CL (1999) Interference coatings based on synthesized silicon nitride. Appl. Opt. 38: 2078–2082
Lehan JP (1996) Determination of grain size in indium tin oxide films from transmission measurements. Appl. Opt. 35: 5048–5051
Lingg LJ, Targove JD, Lehan JP, Macleod HA (1987) Ion-assisted deposition of lanthanide trifluorides for VUV applications. SPIE 818:86–92
Lorenz H, Eisele I, Ramm J, Edlinger J, Biihler M (1991) Characterization of low temperature Si02 and Si3N4 films deposited by plasma enhanced evaporation. J. Vac. Sci. Technol. B 9: 208–214
Luff BJ, Wilkinson JS, Perrone G (1997) Indium tin oxide overlayered waveguides for sensor applications. Appl. Opt. 36: 7066–7072
Macleod HA (1986) Thin-film optical filters. Second edn. Adam Hilger LTD, Bristol, pp 398, 504–511
Martin PJ, Bendavid A, Takikawa H (1999) Ionized plasma vapor deposition and filtered arc deposition; processes, properties and applications. J. Vac. Sci. Technol., A 17: 2351–2359
Martin PM, Stewart DC, Bennett WD, Affinito JD, Gross ME (1997) Multifunctional multilayer optical coatings. J. Vac. Sci. Technol. A 15: 1098–1102
Marx D, Murphy R (1990) Sputtering targets: Challenges for the 1990s. Solid State Technology, March: 11–14
Matsushita Electric Ind Co Ltd. (1994) Manufacture of optical parts. JP 05188204
Matthews A, Bachmann PK (eds) (1991) Diamond and diamond-like carbon coatings 1990. Elsevier Sequoia S.A., Lausanne
Mendez JA, Larruquert JI, Aznarez JA (2000) Preservation of far UV aluminum reflectance by means of overcoating with C60 films. Appl. Opt. 39: 149–156
Merck KGaA (1993) Process for producing evaporation material for preparation of medium refractive index optical films. EP 0 574 785
Merck KGaA (1993) Material for vapour deposition for the production of high refractive optical layers. EP 0 561 289
Newns GR, Pantelis P, Wilson JL, Uffen RWJ, Worthington R (1973) Absorption losses in glasses and glass fibre waveguides. Opto-electronics 5: 289–296
Niederwald H, Laux S, Kennedy M, Schallenberg U, Duparre A, Mertin M, Kaiser N, Ris-tau D (1999) Ion-assisted deposition of oxide materials at room temperature by use of different ion sources. Appl. Opt. 38: 3610–3613
Phillips RW, Bleikolm AF (1996) Optical coatings for document security. Appl. Optics 35: 5529–5534
Phillips RW, Nofi M (1999) Colors by chemistry or by physics. Proceedings SVC: 494–499
Pinard L, Mackowski JM (1997) Synthesis and physicochemical characterization of silicon oxynitride thin films prepared by rf magnetron sputtering. Appl. Opt. 36: 5451–5459
Pulker HK (1979) Characterization of optical thin films. Appl. Opt. 18: 1969–1977
Pulker HK (1999) Coatings on Glass. Second, revised edn. Elsevier, Amsterdam, pp 219–223, 394–428
Rafla-Yuan H, Rancourt JD, Cumbo MJ (1997) Ellipsometric study of thermally evaporated germanium thin film. Appl. Opt. 36: 6360–6363
Rahe M, Oertel E, Reinhardt L, Ristau D, Welling H (1990) Absorption calorimetry and laser induced damage threshold measurements of AR-coated ZnSe and metal mirrors at 10.6 urn. SPIE 1441:113–126
Reicher D, Black P, Jungling K (2000) Defect formation in hafnium dioxide thin films. Appl. Opt. 39: 1589–1599
Ristau D, Gunster S, Bosch S, Duparre A, Masetti E, Ferre-Borrull J, Kiriakidis G, Peiro F, Quesnel E, Tikhonravov A, (2001) UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes. Optical Interference Coatings Banff, OSA Technical Digest: ThA5-l–ThA5–3
Ritter E, Hoffmann R (1969) Influence of substrate temperature on the condensation of vacuum evaporated films of MgF2 and ZnS. J. Vac. Sci. Technol. 6: 733–736
Ritter E (1971) Die Eigenschaften verschiedener Siliciumoxid-Phasen in dunnen Schichten. Vakuum-Technik 21: 42–48
Ritter E (1975) Dielectric film materials for optical applications. In: Hass G, Francombe MH, Hoffman RW (eds) Physics of thin films, vol 8. Academic Press, New York, pp 1–49
Rudisill, JE, Braunstein, M, Braunstein AI (1974) Optical coatings for high energy ZnSe laser windows. Appl. Optics 13: 2075–2080
Scherer K, Nouvelot L, Lacan P, Bosmans R (1996) Optical and mechanical characterization of evaporated Si02 layers. Long term evolution. Appl. Opt. 35: 5067–5072
Schnellbuegel A, Hagedorn H, Anton R (1994) Ion assisted deposition of non-toxic coatings for high power CO2 laser optics. Proc. SPIE 2253: 839–848
Schrenk WJ, Wheatley JA, Lewis RA, Arends CB (1991) Nanolayer polymeric optical films. Tappi 1991 Polymers, laminations and coatings conference
Schultz PC (1974) Optical absorption of the transition elements in vitreous silica. J.Am.Ceram.Soc. 75:309–313
Seeley JS, Hunneman R, Whatley A (1979) Infrared multilayer interference filter manufacture: supposed longwave limit. Appl. Optics 18: 3368–3370
Seeley JS, Hunneman R, Whatley A (1980) Far infrared filters for the Galileo-Jupiter and other missions. Appl. Optics 20: 31–39
Selhofer H, Muller R (1999) Comparison of pure and mixed coating materials for AR coatings for use by reactive evaporation on glass and plastic lenses. Thin Solid Films 351: 180–183
Selhofer H, Ritter E, Linsbod R (2002) Properties of titanium dioxide films prepared by reactive electron beam evaporation from various starting materials. Appl. Opt. 41: 756–762
Shaw DG, Cline DS, Dawson EP, Langlois M (1995) Multicolor interference coating. US-Patent 5877895
Stamm U, Patzel R, Bragin I, Kleinschmidt J, Vofi F, Basting D (1997) Recent developments in industrial excimer laser technology. SPIE 3092:485–492
Sullivan BT, Clarke GA, Akiyama T, Osborne N, Ranger M, Dobrowolski JA, Howe L, Matsumoto A, Song Y, Kikuchi K (2000) High-rate automated deposition system for the manufacture of complex multilayer coatings. Appl. Opt. 39: 157–167
Tabata A, Matsuno N, Suzuoki Y, Mizutani T (1996) Optical properties and structure of Si02 films prepared by ion-beam sputtering. Thin Solid Films 289: 84–89
Tang CW, VanSlyke SA (1987) Organic electroluminescent diodes. Appl. Phys. Lett. 51:913–915
Venzago C, Weigert M. (1994) Application of the glow discharge mass spectrometry (GDMS) for the multi-element trace and ultratrace analysis of sputtering targets. Fre-senius J Anal Chem 350: 303–309
Wang X, Masumoto H, Someno Y, Hirai T (1999) Design and experimental approach of optical reflection filters with graded refractive index profiles. J. Vac. Sci. Technol. A 17:206–211
Weber MF, Stover CA, Gilbert LR, Nevitt TJ, Ouderkirk AJ (2000) Giant birefringent optics in multilayer polymer mirrors. Science 287:2451–2456
Weigert M (2001) New developments in materials for sputtering on glass. International Glass Review Issue 3: 72–76
Wilhartitz P, Ortner HM, Krismer R, Krabichler H (1990) Classical analysis including trace-matrix separation versus solid state mass spectrometry: A comparative study for the analysis of high purity Mo, W and Cr. Microchim. Acta (Wien) II: 259–271
Wille B (1974) Refracting light permeable oxide layer and method for its manufacture. U. S. Patent 3 783 010
Yamada Y, Uyama H, Watanabe S, Nozoye H (1999) Deposition at low substrate temperatures of high quality Ti02 films by radical beam-assisted evaporation. Appl.Opt. 38: 6638–6641
Zhang, S et al (1998) The effects of processing conditions on PbGeTe film performances. Proc SPIE 3175: 429–432
Zöller A, Götzelmann R, Matl K, Cushing D (1996) Temperature-stable bandpass filters deposited with plasma ion-assisted deposition. Appl. Opt. 35: 5609–5619
Zukic M, Torr DG, Spann JF, Torr MR (1990) Vacuum ultraviolet thin films. 1: Optical constants of BaF2, CaF2, LaF3, MgF2, A12O3, HfO2, SiO2 thin films. Appl. Opt. 29:4284–1292
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2003 Springer-Verlag Berlin Heidelberg
About this chapter
Cite this chapter
Friz, M., Waibel, F. (2003). Coating Materials. In: Kaiser, N., Pulker, H.K. (eds) Optical Interference Coatings. Springer Series in Optical Sciences, vol 88. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-36386-6_5
Download citation
DOI: https://doi.org/10.1007/978-3-540-36386-6_5
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-642-05570-6
Online ISBN: 978-3-540-36386-6
eBook Packages: Springer Book Archive