Sputtering Yields

Eckstein, Wolfgang

doi:10.1007/978-3-540-44502-9_3

Wolfgang Eckstein¹

Part of the book series: Topics in Applied Physics ((TAP,volume 110))

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86 Citations

Abstract

Sputtering is caused by collision cascades initiated by energetic ions or neutrals incident on a solid or liquid target. The sputtering yield, Y , i.e., the average number of atoms removed from a target per incident particle (atom or ion), is the most global value in sputtering. It depends on the target material, on the species of bombarding particles and their energy and the angle of incidence. Most experimental and calculated results have been determined for amorphous and polycrystalline targets but also values for single crystal targets are available. An extensive comparison of experimental and calculated yield values are provided and the accuracies of these values are discussed. The sputtering yields of multicomponent systems depend on the bombarding fluence and show sometimes a complicated behaviour.

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Eckstein, W. (2007). Sputtering Yields. In: Sputtering by Particle Bombardment. Topics in Applied Physics, vol 110. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-44502-9_3

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