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Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high resolution SEM, (AR)XPS and AES depth profiling

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Abstract

Thin alumina films deposited by metal-organic chemical vapour deposition (MOCVD) on AISI 304 substrate have been analyzed using the combination of Scanning Electron Microscopy (SEM), Auger Electron Spectroscopy (AES) and Angle Resolved X-ray Photoelectron Spectroscopy (ARXPS). Both the surface and the alumina/substrate interface region have been analyzed in terms of chemical composition and elemental distribution. Only OH-groups (bounded as AlO(OH):boehmite) have been found as an impurity in the surface region of the oxide film. No carbon was detected. Due to higher temperature deposition, the concentration of OH-groups decreased. After annealing, the oxide/substrate interface changes as a result of chromium penetration into the alumina matrix. Carbon impurities have been detected on both delaminated and annealed alumina film surfaces. Also small amounts of sulfate groups as well as Ca and C impurities have been found on delaminated alumina film after prolonged high-temperature annealing.

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References

  1. Morssinkhof RWJ (1991) The deposition of alumina films on steels by MOCVD. PhD Thesis, University of Twente Enschede

    Google Scholar 

  2. Haanappel VAC (1994) Alumina films on metallic substrates by MOCVD. PdD thesis, University of Twente, Enschede

    Google Scholar 

  3. Saraie J, Kwon J, Yodogawa Y (1985) J Electrochem. Soc 132:890–892

    Google Scholar 

  4. Pande KP, Nair VKR, Gutierrez D (1983) J Appl Phys 54:5436–5440

    Google Scholar 

  5. Ramos F, Vieira MT (1992) Mat Manufact Proc 7:251–269

    Google Scholar 

  6. Gellings PJ (1992) Brit Corr J 27:105–112

    Google Scholar 

  7. Haanappel VAC, van Corbach HD, Fransen T, Gellings PJ (1993) Thin Solid Films 230:138–145

    Google Scholar 

  8. Briggs D, Seah MP (1990) Practical surface analysis by auger and X-ray photoelectron spectroscopy, Wiley, Chichester

    Google Scholar 

  9. Moulder JF, Stickle WF, Sobol PE, Bomben KD (1992) Handbook of X-ray photoelectron spectroscopy. Perkin-Elmer, Eden Prairie, MN, USA

    Google Scholar 

  10. Ikeo N, Jijima Y, Niimura N, Sigematsu M, Tazawa T, Matsumoto S, Kojima K, Nagasawa Y (1991) Handbook of X-ray photoelectron spectroscopy. JEOL, USA

    Google Scholar 

  11. Christie AB, Lee J, Sutherland I, Walls JM (1983) Appl Surf Sci 15:224–237

    Google Scholar 

  12. Siriwardene RV, Cook JM (1985) J Colloid Interface Sci 108:414–422

    Google Scholar 

  13. Linberg BJ, Hamrin K, Johansson G, Gelius U, Fahlmann A, Nordling C, Siegbahn K (1970) Phys Scr 1:286–298

    Google Scholar 

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Authors and Affiliations

  1. Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, PL-01-224, Warszawa, Poland

    W. Lisowski

  2. Centre of Materials Research, University of Twente, P.O.Box 217, NL-7500 AE, Enschede, The Netherlands

    A. H. J. van den Berg & M. Smithers

  3. Faculty of Chemical Technology, University of Twente, P.O.Box 217, NL-7500 AE, Enschede, The Netherlands

    V. A. C. Haanappel

Authors
  1. W. Lisowski
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  2. A. H. J. van den Berg
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  3. M. Smithers
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  4. V. A. C. Haanappel
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Lisowski, W., van den Berg, A.H.J., Smithers, M. et al. Characterization of thin alumina films prepared by metal-organic chemical vapour deposition (MOCVD) by high resolution SEM, (AR)XPS and AES depth profiling. Fresenius J Anal Chem 353, 707–712 (1995). https://doi.org/10.1007/BF00321355

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  • DOI: https://doi.org/10.1007/BF00321355

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