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The mechanism of spongy electrodeposits formation on inert substrate at low over potentials

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Abstract

The mechanism of formation of spongy deposits on inert substrates at low overpotentials is discussed.

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Abbreviations

C 0 :

bulk concentration

D :

diffusion coefficient

F :

Faraday constant

f :

exp (η/η o,c) — exp (−η/η o,a)

f 1 :

exp (η/η o,c)

f 2 :

exp (−η/η o,a)

i 0 :

exchange current density

i :

current density

i L :

limiting current density

i L,S :

limiting current density under spherical diffusion control

n :

number of electrons

N :

number of nuclei (cm2)

r :

radius of growing nucleus

r 0 :

radius of critical nucleus

r c :

radius of growing nucleus at which deposition becomes mixed controlled

t :

time

t i :

induction time for spongy growth initiation

V :

molar volume

γ :

surface energy

δ :

thickness of diffusion layer

2,3η o,c :

slope of cathodic Tafel line

2,3η o,a :

slope of anodic Tafel line

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Authors and Affiliations

  1. Faculty of Technology and Metallurgy, University ofBeograd, Beograd, Yugoslavia

    K. I. Popov & N. V. Krstajić

  2. Institute for Electrochemistry ICTM, University ofBeograd, Beograd, Yugoslavia

    N. V. Krstajić

Authors
  1. K. I. Popov
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  2. N. V. Krstajić
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Popov, K.I., Krstajić, N.V. The mechanism of spongy electrodeposits formation on inert substrate at low over potentials. J Appl Electrochem 13, 775–782 (1983). https://doi.org/10.1007/BF00615827

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  • DOI: https://doi.org/10.1007/BF00615827

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