Temperature-dependent sputtering of metals and insulators

Abstract

The temperature dependence of the sputter yield and the energy spectrum of sputtered atoms have been investigated on the basis of a standard model for thermal spikes. A high-temperature and a low-temperature regime have been identified in the temperature spectrum making up the evaporation yield. The high-temperature component of the yield as well as the associated energy spectrum are only very weakly dependent on ambient target temperature. The relative variation is the less pronounced the higher the spike temperature. The low-temperature component is associated with the long-time behavior of the spike, and measurable evaporation takes place over time intervals where spikes overlap. The importance of time constants for macroscopic heat transport is pointed out. The results are shown to provide a framework within which experimental results on the temperature dependence of the sputter yield of metals can be explained. The results are also consistent with measured temperature dependences in the sputter yield of insulators.