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Thin films of molybdenum and tungsten disulphides by metal organic chemical vapour deposition

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Abstract

Thin films of MoS2 and WS2 have been prepared on various substrates (glass, quartz, LiF, MgO, mica, molybdenum, gold, platinum, aluminium, copper, steel, graphite, MoSe2) by metal-organic chemical vapour deposition using sulphur or hydrogen sulphide and the hexacarbonyls of the transition metals as volatile components. The deposition technique is described here. The thin layers have been examined by X-ray powder diffraction and scanning electron microscopy. Time-resolved microwave conductivity measurements were used to detect the photoactivity of these materials.

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Authors and Affiliations

  1. Bereich Strahlenchemie, Hahn-Meitner-Institut Berlin, Glienicker Str. 100, 1000, Berlin 39, Germany

    Wolfgang K. Hofmann

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  1. Wolfgang K. Hofmann
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Hofmann, W.K. Thin films of molybdenum and tungsten disulphides by metal organic chemical vapour deposition. J Mater Sci 23, 3981–3986 (1988). https://doi.org/10.1007/BF01106824

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  • DOI: https://doi.org/10.1007/BF01106824

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