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High-temperature stability of Nicalon under Ar or O2 atmosphere

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Abstract

The thermal stability of Nicalon NL400 at 1573, 1673 and 1773 K has been studied by TGA and XRD. Under an Ar atmosphere, Nicalon pyrolysed severely to crystallize into β-SiC involving the generation of both SiO and CO. Under an O2 atmosphere, the oxide film which formed around Nicalon retarded the pyrolytic reaction of the core. Nicalon coated with a silica film by the previous oxidation treatment pyrolysed hardly at all under an Ar atmosphere, because the film restricted the escape of SiO and CO. Nicalon which was oxidation-treated at 1773 K retained 63% of its original strength after heating at 1773 K under an Ar atmosphere. The amorphous silica film was found to resist rapid thermal cycling between room temperature and elevated temperatures.

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Authors and Affiliations

  1. Department of Metallurgy and Materials Science, College of Engineering, University of Osaka Prefecture, Gakuen-cho, Sakai-shi, 593, Osaka-fu, Japan

    T. Shimoo, H. Chen & K. Okamura

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  1. T. Shimoo
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  2. H. Chen
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  3. K. Okamura
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Shimoo, T., Chen, H. & Okamura, K. High-temperature stability of Nicalon under Ar or O2 atmosphere. J Mater Sci 29, 456–463 (1994). https://doi.org/10.1007/BF01162506

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