Abstract
Applications of improved 1-D/ 2-D NMR spectroscopic techniques have been reviewed for quantitatively estimating the incorporation of different monomers and degree of linearity in resin microstructure. Comparison of the NMR data with those from lithography leads to a distinct correlation between resin micro-structure and lithographic performance. A novel photoresist mechanism is proposed in a positive photoresist; also, using modern NMR techniques, the crosslinking mechanism in a negative photoresist has been studied.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Bähr G, Westerwelle U and Gruetzner G 1997Proc SPIE-Int. Soc. Opt. Eng. 3049 628
Blevins R W, Daly R C and Turner S R 1987Encyclopedia of polymer science and engineering (ed.) J I Krocehwitz (USA: John Wiley & Sons)9 p. 107
Bogan L E and Wolk S K 1992Macromolecules 25 161
Eswaran S V, Basu P K and Roy Debmalya 2001Patent applied for
Eswaran S V British patent, UK 277897 1996; Australian patent, AU 672220 1997
Eswaran S V and Sajadian S K 1988Synth. Commun. 18 1807
Fitzgerald E A 1990J. Appl. Polym. Sci. 41 1809
Hanabata M, Uetani Y and Furuta A 1989J. Vac. Sci. Technol. B7 640
Hattori K T, Hattori T, Uchino S, Ueno T, Hayashi N, Shirai S, Moriuchi N and Morita M 1992Jpn. J. Appl. Phys. 31 4307
Khadim M A, Rahman M D and Durham D L 1992Proc. SPIE- Int. Soc. Opt. Eng. 1672 347
Kopf P W 1988Encyclopedia of polymer science and engi- neering (ed.) J I Krosehwitz (USA: John Wiley & Sons)11 p. 50
Mukoyama Y, Tanno T, Yokokawa H and Fleming J 1973J. Polym. Sci. 3 3193
Reiser A, Shih H Y, Yeh T F and Huang J P 1996Angew. Chem. Int. Ed. Engl. 35 2428
Roy Debmalya, Basu P K and Eswaran S V 2002Resonance 7 44, 59
Roy Debmalya, Basu P K, Raghunathan P and Eswaran S V 2003aPolym. Int. 52 757
Roy Debmalya, Basu P K, Raghunathan P and Eswaran S V 2003bMagn. Reson. Chem. 41 84
Roy Debmalya, Basu P K, Raghunathan P and Eswaran S V 2003cMagn. Reson. Chem. 41 671
Roy Debmalya, Basu P K, Raghunathan P and Eswaran S V 2003dJ. Appl. Polym. Sci. 89 1959
Roy Debmalya, Gandhi A, Basu P K, Raghunathan P and Eswa- ran S V 2003eMicroelectron. Eng. 70 58
Roy Debmalya, Basu P K, Raghunathan P and Eswaran S V 2004aMagn. Reson. Chem. 42 76
Roy Debmalya, Basu P K, Raghunathan P and Eswaran S V 2004bJ. Appl. Polym. Sci. 91 2096
Turner S R and Daly R C 1988J. Chem. Edu. 65 322
Tyman J H P 1979Chem. Soc. Revs. 8 499
Uchino S, Tanaka T, Ueno T and Iwayanagi T 1991J. Vac. Sci. Technol. B9 3162
Ueno T 1998Microlithography: Science and technology (eds) J R Sheats and B W Smith (USA: Marcel Dekker) p. 429
Voigt Anja 1999 Ph.D. Thesis, Humboldt University, Berlin
Wallraff G M and Hinsberg W D 1999Chem. Rev. 99 1801
Zöllinger H 1994Diazo chemistry I: Aromatic and heterocyclic compounds (New York: VCH Publishers) p. 285
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Roy, D., Basu, P.K., Raghunathan, P. et al. Designing of high-resolution photoresists: use of modern NMR techniques for evaluating lithographic performance. Bull Mater Sci 27, 303–316 (2004). https://doi.org/10.1007/BF02708521
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF02708521