One-pot synthesis of molecular glass photoresists based on β-cyclodextrin containing a t-butyloxy carbonyl group for i-line lithography

Positive chemically amplified molecular glass with pendant t-butyloxy carbonyl (t-BOC) groups based on β-cyclodextrin (β-CD) was prepared. The β-CD derivatives were obtained from the reaction of β-CD and di-tert-butyl dicarbonate (DBDC) in the presence of 4-dimethylaminopyridine, and the protecting ratio was controlled using various feed amounts of DBDC. Fourier-transform infrared spectroscopy and proton nuclear magnetic resonance were employed to characterize the chemical structure, indicating that the synthesis was successful. Thermal behavior was characterized by thermogravimetric analysis; the results showed that the initial thermal decomposition temperature occurred at approximately 160 °C, which could satisfy the lithography process. Ultraviolet–visible spectrophotometer indicated that the t-BOC-protected β-CD derivatives had low absorbance at 365 nm wavelength. Additionally, X-ray diffraction analysis results showed that the β-CD derivatives had amorphous form, and exhibited excellent film-forming property. The photoresists consisting of different t-BOC protecting groups showed high sensitivity when exposed to 365 nm light and post-baked at 105 °C for 90 s, followed by developing in 2.38 wt% aqueous tetramethylammonium hydroxide solution at room temperature. An enhanced line and space positive patterns with 1 μm resolution were delineated according to digital microscope.