Abstract
Nd-substituted bismuth titanate Bi3.54Nd0.46Ti3O12 (BNT) thin films were prepared on (111)Pt/Ti/SiO2/Si substrates by a sol–gel method. The BNT thin films processed at a low annealing temperature of ∼600 °C showed good ferroelectric properties. The randomly oriented BNT single phases and the improved ferroelectric properties were confirmed by X-ray diffraction and polarization–electric field hysteresis loops, respectively. The remanent polarization of the BNT thin films is 64 μC/cm2, which is larger than that of Bi3.25La0.75Ti3O12 (BLT) thin films. After 1010 read/write switching cycles, the effective non-volatile charges showed no polarization fatigue. Regardless of the low annealing temperature of 600 °C, the BNT thin films had good ferroelectric properties with high remanent polarizations and strong fatigue resistances.
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References
J.F. Scott: Ferroelectric Memories (Springer, Berlin 2000)
K. Kato, C. Zheng, J.M. Finder, S.K. Dey, Y. Torii: J. Am. Ceram. Soc. 81, 1869 (1998)
B.H. Park, B.S. Kang, S.D. Bu, T.W. Noh, J. Lee, W. Jo: Nature 401, 682 (1999)
I.W. Kim, C.W. Ahn, J.S. Kim, T.K. Song, J.-S. Bae, B.C. Choi, J.-H. Jeong, J.S. Lee: Appl. Phys. Lett. 80, 4006 (2002)
D. Wu, A.D. Li, T. Yu, N.B. Ming: Appl. Phys. A 78, 95 (2004)
X. Du, I.-W. Chen: J. Am. Ceram. Soc. 81, 3253 (1998)
J.S. Kim, S.S. Kim, J.K. Kim, T.K. Song: Jpn. J. Appl. Phys. 41, 5497 (2002)
T. Watanabe, H. Funakubo, M. Osada, Y. Noguchi, M. Miyayama: Appl. Phys. Lett. 10, 100 (2002)
J.S. Kim, S.S. Kim, T.K. Song: J. Korean Phys. Soc. 43, 548 (2003)
M. Yamada, N. Iizawa, T. Yamaguchi, W. Sakamoto, K. Kikuta, T. Yogo, T. Hayashi, S. Hirano: Jpn. J. Appl. Phys. 42, 5222 (2003)
X.J. Meng, J.H. Ma, J.L. Sun, T. Lin, J. Yu, G.S. Wang, J.H. Chu: Appl. Phys. A 78, 1089 (2004)
T. Kojima, T. Watanabe, H. Funakubo, K. Saito, M. Osada, M. Kakihana: J. Appl. Phys. 93, 1707 (2003)
U. Chon, H.M. Jang, M.G. Kim, C.H. Chang: Phys. Rev. Lett. 89, 87601-1 (2002)
A. Garg, Z.H. Barber, M. Dawber, J.F. Scott, A. Snedden, P. Lightfoot: Appl. Phys. Lett. 83, 2414 (2003)
T. Hayashi, N. Iizawa, D. Togawa, M. Yamada, W. Sakamoto, S. Hirano: Jpn. J. Appl. Phys. 42, 1660 (2003)
M. Yamaguchi, T. Nagamoto, O. Omoto: Thin Solid Films 300, 299 (1997)
J.S. Kim, S.S. Kim, J.K. Kim: Jpn. J. Appl. Phys. 42, 6486 (2003)
B.H. Park, S.J. Hyun, S.D. Bu, T.W. Noh, J. Lee, H.-D. Kim, T.H. Kim, W. Jo: Appl. Phys. Lett. 74, 1907 (1999)
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Kim, J., Kim, S. Ferroelectric properties of Nd-substituted bismuth titanate thin films processed at low temperature. Appl. Phys. A 81, 1427–1430 (2005). https://doi.org/10.1007/s00339-004-3190-0
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DOI: https://doi.org/10.1007/s00339-004-3190-0