Abstract
Zinc oxide thin films were prepared by dc (direct current) and rf (radio frequency) magnetron sputtering on glass substrates. ZnO films produced by dc sputtering have a high resistance, while the films produced using rf sputtering are significantly more conductive. While the conductive films have a compact nodular surface morphology, the resistive films have a relatively porous surface with columnar structures in cross section. Compared to the dc sputtered films, rf sputtered films have a microstructure with smaller d spacing, lower internal stress, higher band gap energy and higher density. Dependence of conductivity on the deposition technique and the resulting d spacing , stress, density, band gap, film thickness and Al doping are discussed. Correlations between the electrical conductivity, microstructural parameters and optical properties of the films have been made.
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73.25.+i; 81.15.cd; 81.05.ys
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Lee, J., Gao, W., Li, Z. et al. Sputtered deposited nanocrystalline ZnO films: A correlation between electrical, optical and microstructural properties. Appl. Phys. A 80, 1641–1646 (2005). https://doi.org/10.1007/s00339-004-3197-6
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DOI: https://doi.org/10.1007/s00339-004-3197-6