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Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis

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Abstract

This paper reports the synthesis and characterization of fluorine-doped tin oxide (FTO) thin films via intermittent spray pyrolysis utilizing a solution mixture of tin chloride pentahydrate and ammonia fluoride. Utilizing the same solution, nanorod arrays were fabricated via template-based growth. Uniform and crack-free FTO films over 20×20 mm with a thickness up to 900 nm have been routinely achieved; such FTO films demonstrate electrical resistivity as low as 2.2×10-4 Ω cm as well as good optical transparency ranging from 75 to 85%. In addition, FTO nanorods were fabricated using template-filling methods at a temperature of 440 °C. The nanorods have a diameter of ∼160–250 nm, appear to be comprised of small nanoparticles 5–10 nm in size, and have a resistivity value of 4×10-1 Ω cm.

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Authors and Affiliations

  1. Department of Materials Science and Engineering, University of Washington, 302 Roberts Hall, Box 352120, Seattle, WA, 98195, USA

    B. Russo & G.Z. Cao

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  1. B. Russo
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  2. G.Z. Cao
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Correspondence to G.Z. Cao.

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PACS

81.07.-b; 73.61.-r; 81.16.Be

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Russo, B., Cao, G. Fabrication and characterization of fluorine-doped thin oxide thin films and nanorod arrays via spray pyrolysis. Appl. Phys. A 90, 311–315 (2008). https://doi.org/10.1007/s00339-007-4274-4

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  • DOI: https://doi.org/10.1007/s00339-007-4274-4

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