Abstract
Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.
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Wu, W., Walmsley, R.G., Li, WD. et al. Nanoimprint lithography with ≤60 nm overlay precision. Appl. Phys. A 106, 767–772 (2012). https://doi.org/10.1007/s00339-012-6775-z
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DOI: https://doi.org/10.1007/s00339-012-6775-z