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Electron-beam deposition of vanadium dioxide thin films

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Abstract

Developing a reliable and efficient fabrication method for phase-transition thin-film technology is critical for electronic and photonic applications. We demonstrate a novel method for fabricating polycrystalline, switchable vanadium dioxide thin films on glass and silicon substrates and show that the optical switching contrast is not strongly affected by post-processing annealing times. The method relies on electron-beam evaporation of a nominally stoichiometric powder, followed by fast annealing. As a result of the short annealing procedure we demonstrate that films deposited on silicon substrates appear to be smoother, in comparison to pulsed laser deposition and sputtering. However, optical performance of e-beam evaporated film on silicon is affected by annealing time, in contrast to glass.

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Acknowledgement

K.A. was supported by a research assistantship provided by the Defense Threat Reduction Agency (HDTRA1-10-1-0016). R.E.M. was supported by the Office of Science, U.S. Department of Energy (DE-FG02-01ER45916). Portions of this work were performed at the Vanderbilt Institute of Nanoscale Science and Engineering, using facilities renovated under NSF ARI-R2 DMR-0963361. We thank Professors Jim Wittig and Charles Lukehart for their helpful discussions related to the analysis of this work.

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Authors and Affiliations

  1. Interdisciplinary Materials Science Program, Vanderbilt University, Nashville, TN, 37234-0106, USA

    R. E. Marvel, K. Appavoo & R. F. Haglund Jr.

  2. Institute for Nanoscale Science and Engineering, Vanderbilt University, Nashville, TN, 37234-0106, USA

    R. F. Haglund Jr.

  3. Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, 37235, USA

    B. K. Choi

  4. Department of Physics and Astronomy, Vanderbilt University, Nashville, TN, 37235-1807, USA

    J. Nag & R. F. Haglund Jr.

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  1. R. E. Marvel
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  2. K. Appavoo
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  3. B. K. Choi
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  4. J. Nag
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  5. R. F. Haglund Jr.
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Correspondence to R. E. Marvel.

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R.E. Marvel and K. Appavoo contributed equally to this work.

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Marvel, R.E., Appavoo, K., Choi, B.K. et al. Electron-beam deposition of vanadium dioxide thin films. Appl. Phys. A 111, 975–981 (2013). https://doi.org/10.1007/s00339-012-7324-5

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  • DOI: https://doi.org/10.1007/s00339-012-7324-5

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