Abstract
To investigate the effects of oxygen pressure on the structural and phase transition properties for VO2/c-sapphire, highly orientated VO2 thin films were grown on (0001) sapphire substrates by pulsed laser deposition (PLD) with different oxygen pressures. The crystal structure, morphology and component of the films were systematically investigated. The temperature-dependent resistance (R-T) measurement was conducted, which showed the distinct phase transition characteristic for the prepared films. The results indicate that the oxygen pressure plays an important role for the VO2 film preparation. The film grown at 1.7 Pa has lower phase transition temperature, higher film strain, and smaller grain size than that at 5.4 Pa, while no obvious crystal phase transition is observed. The experiment suggests that even a small change in oxygen pressure can influence the structure, morphology and phase-transition behavior of VO2 films obviously, and its potential causes are mainly attributed to the reduction of the kinetic energy to the substrate for target atoms caused by the oxygen pressure, the resulting grain aggregation and interfacial stress.
Similar content being viewed by others
References
F.J. Morin, Phys. Rev. Lett. 3, 34–36 (1959)
C.H. Griffith, H.K. Eastwood, J. Appl. Phys. 45, 2201–2206 (1974)
M. Fukuma, S. Zembutsu, S. Miyazawa, Appl. Opt. 22, 265–268 (1983)
E.E. Chain, J. Vac. Sci. Technol. A 4, 432–435 (1986)
A. Razavi, L. Bobyak, P. Fallon, J. Vac. Sci. Technol. A 8, 1391–1394 (1990)
K.L. Holman, T.M. McQueen, A.J. Williams, T. Klimczuk, P.W. Stephens, H.W. Zandbergen, Q. Xu, F. Ronning, R.J. Cava, Phys. Rev. B 79, 8 (2009)
T.D. Manning, I.P. Parkin, M.E. Pemble, D. Sheel, D. Vernardou, Chem. Mater. 16, 744–749 (2004)
T. Kikuzuki, M. Lippmaa, Appl. Phys. Lett. 96, 3 (2010)
F.C. Case, J. Vac, Sci. Technol. A 2, 1509–1512 (1984)
R. Lopez, T.E. Haynes, L.A. Boatner, L.C. Feldman, R.F. Haglund, Phys. Rev. B 65, 5 (2002)
L.L. Fan, Y.F. Wu, C. Si, C.W. Zou, Z.M. Qi, L.B. Li, G.Q. Pan, Z.Y. Wu, Thin Solid Films 520, 6124–6129 (2012)
B.G. Chae, H.T. Kim, S.J. Yun, B.J. Kim, Y.W. Lee, D.H. Youn, K.Y. Kang, Electrochem. Solid-State Lett. 9, C12–C14 (2006)
D. Vernardou, M.E. Pemble, D.W. Sheel, Surf. Coat. Technol. 188, 250–254 (2004)
X.J. Wang, H.D. Li, Y.J. Fei, X. Wang, Y.Y. Xiong, Y.X. Nie, K.A. Feng, Appl. Surf. Sci. 177, 8–14 (2001)
Z.P. Wu, S. Yamamoto, A. Miyashita, Z.J. Zhang, K. Narumi, H. Naramoto, J. Phys. Condens. Mater. 10, L765–L771 (1998)
T.H. Yang, S. Nori, H.H. Zhou, J. Narayan, Appl. Phys. Lett. 95, 3 (2009)
Y. Muraoka, Z. Hiroi, Appl. Phys. Lett. 80, 583–585 (2002)
J.Y. Suh, R. Lopez, L.C. Feldman, R.F. Haglund, J. Appl. Phys. 96, 1209–1213 (2004)
K. Nagashima, T. Yanagida, H. Tanaka, T. Kawai, Phys. Rev. B 74, 4 (2006)
A. Kaushal, N. Choudhary, N. Kaur, D. Kaur, Appl. Surf. Sci. 257, 8937–8944 (2011)
B. Chen, D.F. Yang, P.A. Charpentier, M. Zeman, Sol. Energy Mater. Sol. Cells 93, 1550–1554 (2009)
K. Nagashima, T. Yanagida, H. Tanaka, T. Kawai, J. Appl. Phys. 100, 4 (2006)
A. Gupta, J. Narayan, T. Dutta, Appl. Phys. Lett. 97, 3 (2010)
J. Nag, E.A. Payzant, K.L. More, R.F. Haglund Jr., Appl. Phys. Lett. 98, 3 (2011)
K. Kato, P.K. Song, H. Odaka, Y. Shigesato, Jpn. J. Appl. Phys. 42, 6523–6531 (2003)
T.H. Yang, C.M. Jin, R. Aggarwal, R.J. Narayan, J. Narayan, J. Mater. Res. 25, 422–426 (2010)
P. Mandal, A. Speck, C. Ko, S. Ramanathan, Opt. Lett. 36, 3 (2011)
G.J. Kovacs, D. Buerger, I. Skorupa, H. Reuther, R. Heller, H. Schmidt, J. Appl. Phys. 109, 5 (2011)
H. Koo, S. Yoon, O.J. Kwon, K.E. Ko, D. Shin, S.H. Bae, S.H. Chang, C. Park, J. Mater. Sci. 47, 6397–6401 (2012)
Y. Muraoka, Y. Ueda, Z. Hiroi, J. Phys. Chem. Solids 63, 965–967 (2002)
G. Silversmit, D. Depla, H. Poelman, G.B. Marin, R. De Gryse, J. Electron Spectrosc. 135, 167–175 (2004)
C. Blauw, F. Lechnhouts, F. Van der Woude, G.A. Sawatzki, J. Phys. C 8, 10 (1975)
T.D. Manning, I.P. Parkin, J. Mater. Chem. 14, 2554–2559 (2004)
R. Lindstrom, V. Maurice, S. Zanna, L. Klein, H. Groult, L. Perrigaud, C. Cohen, P. Marcus, Surf. Interface Anal. 38, 6–18 (2006)
N. Alov, D. Kutsko, I. Spirovova, Z. Bastl, Surf. Sci. 600, 1628–1631 (2006)
A. Zylbersztejn, N.F. Mott, Phys. Rev. B 11, 4383–4395 (1975)
Acknowledgements
The authors thank Dr. Shao Tao and Dr. Fan Lele for their help in preparing and measuring samples, respectively. This work was supported by the National Natural Science Foundation of China (11175183, 21271007), Post-doctoral Research Start-up Funding of Anhui Jianzhu University (K02553), and Open Project of Building Energy Conservation Institute of Anhui Jianzhu University (K02592).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Guo, Y.X., Liu, Y.F., Zou, C.W. et al. Oxygen pressure induced structure, morphology and phase-transition for VO2/c-sapphire films by PLD. Appl. Phys. A 115, 1245–1250 (2014). https://doi.org/10.1007/s00339-013-7972-0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00339-013-7972-0