Abstract
The spatio-temporal evolution of the silicon monoxide SiO plasma produced by a high-power CO2 pulsed laser has been investigated using optical emission spectroscopy (OES) and imaging methods. The formed plasma was found to be strongly ionized, yielding Si+, O+, Si2+, O2+ and Si3+ species, rich in neutral silicon and oxygen atoms, and very weak molecular bands of SiO time-integrated and time-resolved two-dimensional OES plasma profiles were recorded as a function of emitted wavelength and distance from the target. The temporal behavior of specific emission lines of Si, Si+, O+, Si2+ and O2+ was characterized. The results show a faster decay of O2+ and Si2+ than that of O+, Si+ and Si. The Stark broadening of isolated single-ionized silicon emission lines was employed for deducing the electron density during the plasma expansion. The relative intensities of two Si2+ lines were used to calculate the time evolution of the plasma temperature.
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References
K. Seshan, Hanbook of Thin-film Deposition Processes and Techniques. Principles, Methods, Equipment and Applications (Noyes publications, New York, 2002)
D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Film (Wiley, New York, 1994)
D.K. Pallotti, E. Orabona, S. Amoruso et al., J. Appl. Phys. 114, 043503 (2013)
A. De Giacomo, M. Dell’Aglio, R. Gaudiuso, S. Amoruso, O. De Pascale, Spectrochimica Acta B 78, 1 (2012)
L. Diaz, M. Santos, J.A. Torresano et al., Appl. Phys. A 85, 33 (2006)
M. Jadraque, M. Santos, L. Díaz, M. Martín, J. Álvarez-Ruiz, J. Phys. Chem. A 113, 10880 (2009)
V. Drinek, J. Pola, Z. Bastl, J. Šubrt, J. Non Cryst. Solids 288, 30 (2001)
S.S. Harilal, C.V. Bindhu, M.S. Tillack, F. Najmabadi, J. Appl. Phys. 93, 2380 (2003)
J.P. Singh, S.N. Thakur, Laser-Induced Breakdown Spectroscopy (Elsevier, New York, 2007)
J.J. Camacho, M. Santos, L. Diaz, L.J. Juan, J.M.L. Poyato, Appl. Phys. A 99, 159 (2010)
J.J. Camacho, L. Diaz, M. Santos, J.M.L. Poyato, Spectrochim. Acta B 66, 57 (2011)
J. Kruger, H. Nino, A. Yabe, Appl. Surf. Sci. 197–198, 800 (2002)
NIST Atomic Spectra Database (version 3.1.5), USA. Available at: http://physics.nist.gov
J.J. Camacho, L. Diaz, J.P. Cid, J.M.L. Poyato, Spectrochim. Acta B 88, 203 (2013)
T. Fujimoto, R.W.P. McWhirter, Phys. Rev. A 42, 6588 (1990)
G. Cristoforetti, A. De Giacomo, M. Dell’Aglio et al., Spectrochim. Acta B 65, 86 (2010)
M. Rossa, C.A. Rinaldi, J.C. Ferrero, J. Appl. Phys. 105, 63306 (2009)
H.R. Griem, Phys. Rev. 128, 515 (1962)
D. Campos, S.S. Harilal, A. Hassanein, Appl. Phys. Lett. 96, 15501 (2010)
T. Fujimoto, R.W.P. McWhirter, Phys. Rev. A 42, 6588 (1990)
Acknowledgments
We gratefully acknowledge the support received by the MICINN (Spain, Ministerio de Ciencia e Innovación), Project: CTQ2010-15680 for this research.
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Diaz, L., Camacho, J.J., Cid, J.P. et al. Time evolution of the infrared laser ablation plasma plume of SiO. Appl. Phys. A 117, 125–129 (2014). https://doi.org/10.1007/s00339-014-8287-5
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DOI: https://doi.org/10.1007/s00339-014-8287-5