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Investigation of mechanical properties of CVD grown titanium silicon nitride thin films under reduced atmosphere

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Abstract

Titanium silicon nitride (TiSiN) thin films were deposited by thermal chemical vapour deposition using TiO2 + Si3N4 powder with different H2 flow rates. Morphological, structural, and mechanical properties of deposited TiSiN films were characterized using different techniques by SEM, XRD, Raman, and nano-indentation. SEM images reveal that surface roughness of TiSiN thin films decreased with increasing of H2 flow rate. The Raman spectroscopy indicated that the intensity of acoustic phonon mode decreases, whereas intensity of optical phonon mode increases with increasing of H2 flow rate. The maximum hardness, Young’s modulus, and yield strength of the TiSiN films are 18.23, 185.26, and 83.2 GPa, respectively. The crystallite size and lattice strain of TiSiN thin films vary 2.08–4.43 nm and 0.02–0.055, respectively, for different H2 flow rates. The quantitative and qualitative analyses of TiSiN thin were carried out using the Origin 9.0 software.

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Authors and Affiliations

  1. Department of Mechanical Engineering, Sikkim Manipal Institute of Technology, Majhitar, 737136, India

    Spandan Guha, Soham Das & Bibhu P. Swain

  2. Department of Mechanical Engineering, Jadavpur University, Kolkata, 700035, India

    Asish Bandyopadhyay

  3. Department of Mechanical Engineering, Kalyani Government Engineering College, Kalyani, 741235, India

    Santanu Das

  4. Centre for Material Science and Nano-Technology, Sikkim Manipal Institute of Technology, Majhitar, 737136, India

    Bibhu P. Swain

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  1. Spandan Guha
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Correspondence to Bibhu P. Swain.

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Guha, S., Das, S., Bandyopadhyay, A. et al. Investigation of mechanical properties of CVD grown titanium silicon nitride thin films under reduced atmosphere. Appl. Phys. A 124, 35 (2018). https://doi.org/10.1007/s00339-017-1455-7

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  • DOI: https://doi.org/10.1007/s00339-017-1455-7

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