Reactivation of damaged rare earth luminescence centers in ion-implanted metal–oxide–silicon light emitting devices

Abstract

Charge trapping and quenching of electroluminescence (EL) in SiO₂ layers implanted by Ge and rare earth (RE) ions during hot electron injection were investigated. In case of the SiO₂:Ge layer the EL quenching is caused by the transformation of the luminescent defects ($\equiv$Ge–Si$\equiv$ or $\equiv$Ge–Ge$\equiv$) to optically inactive centers during hot electron excitation, whereas the EL from rare earth centers is quenched due to the electron trapping by RE-centers or their surroundings, but not due to their optical deactivation. Therefore, the flash lamp post-injection annealing releasing trapped electrons reactivates RE centers and increases the operating time of metal–oxide–silicon light emitting devices (MOSLEDs).