Skip to main content
Erschienen in: Microsystem Technologies 1/2018

10.11.2017 | Technical Paper

A novel design of a low-voltage low-loss T-match RF-MEMS capacitive switch

verfasst von: Li-Ya Ma, Anis Nurashikin Nordin, Norhayati Soin

Erschienen in: Microsystem Technologies | Ausgabe 1/2018

Einloggen

Aktivieren Sie unsere intelligente Suche, um passende Fachinhalte oder Patente zu finden.

search-config
loading …

Abstract

This paper presents a novel design, optimization and analysis of capacitive radio frequency (RF) micro-electromechanical system (MEMS) switch. The design incorporates a novel membrane and beams’ structure with two short high-impedance transmission-line (T-line) sections added on either side of the switch (namely T-match switch) to improve its RF performance, while maintaining low-actuation voltage. The short high-impedance T-line section has narrower width and higher impedance than the coplanar waveguide (CPW)’s signal line, behaves as series inductor to compensate the switch’s up-state capacitance and provides excellent matching at the design frequency. This high-impedance T-line section was designed, simulated and optimized using finite-element-modelling (FEM) tool of electromagnetic (EM) simulator of AWR Design EnvironmentTM. The optimized T-line section’s width and length is 10 µm and 70 µm, respectively. The RF-MEMS switch is actuated by electrostatic force with low-actuation voltage of 2.9 V, has maximum von Mises stress of 13.208 MPa which is less than aluminium’s yield stress and can be operated in robust conditions. Compared to the normal capacitive RF-MEMS switch, this T-match capacitive RF-MEMS switch with two sections of optimized high-impedance T line has improved the performance of return loss and insertion loss, at switch-on state, by 45.83% and 55.35%, respectively; while at the switch-off state, the isolation is increased by 24.05%; only the switch-off return loss is degraded by 11.7% but the value (− 0.5519 dB) is still located in the range of design specifications. The RF-MEMS switch’s actuation time was simulated to be ~ 27 µs with amplitude of 5 V up-step voltage.

Sie haben noch keine Lizenz? Dann Informieren Sie sich jetzt über unsere Produkte:

Springer Professional "Wirtschaft+Technik"

Online-Abonnement

Mit Springer Professional "Wirtschaft+Technik" erhalten Sie Zugriff auf:

  • über 102.000 Bücher
  • über 537 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Finance + Banking
  • Management + Führung
  • Marketing + Vertrieb
  • Maschinenbau + Werkstoffe
  • Versicherung + Risiko

Jetzt Wissensvorsprung sichern!

Springer Professional "Technik"

Online-Abonnement

Mit Springer Professional "Technik" erhalten Sie Zugriff auf:

  • über 67.000 Bücher
  • über 390 Zeitschriften

aus folgenden Fachgebieten:

  • Automobil + Motoren
  • Bauwesen + Immobilien
  • Business IT + Informatik
  • Elektrotechnik + Elektronik
  • Energie + Nachhaltigkeit
  • Maschinenbau + Werkstoffe




 

Jetzt Wissensvorsprung sichern!

Literatur
Zurück zum Zitat Balaraman D, Bhattacharya SK, Ayazi F, Papapolymerou J (2002) Low-cost low actuation voltage copper RF MEMS switches. In: 2002 IEEE MTT-S international microwave symposium digest, vol 2, pp 1225–1228. doi:10.1109/MWSYM.2002.1011879 Balaraman D, Bhattacharya SK, Ayazi F, Papapolymerou J (2002) Low-cost low actuation voltage copper RF MEMS switches. In: 2002 IEEE MTT-S international microwave symposium digest, vol 2, pp 1225–1228. doi:10.​1109/​MWSYM.​2002.​1011879
Zurück zum Zitat Fernández-Bolaños M, Perruisseau-Carrier J, Dainesi P, Ionescu AM (2008) RF MEMS capacitive switch on semi-suspended CPW using low-loss high-resistivity silicon substrate. Microelectron Eng 85(5):1039–1042. doi:10.1016/j.mee.2008.01.093 CrossRef Fernández-Bolaños M, Perruisseau-Carrier J, Dainesi P, Ionescu AM (2008) RF MEMS capacitive switch on semi-suspended CPW using low-loss high-resistivity silicon substrate. Microelectron Eng 85(5):1039–1042. doi:10.​1016/​j.​mee.​2008.​01.​093 CrossRef
Zurück zum Zitat Ma LY, Soin N, Nordin AN (2016) A novel design of low-voltage low-loss K-band RF-MEMS capacitive switch. In: 2016 IEEE symposium on design, test, integration and packaging of MEMS/MOEMS (DTIP), pp 1–5. doi:10.1109/DTIP.2016.7514827 Ma LY, Soin N, Nordin AN (2016) A novel design of low-voltage low-loss K-band RF-MEMS capacitive switch. In: 2016 IEEE symposium on design, test, integration and packaging of MEMS/MOEMS (DTIP), pp 1–5. doi:10.​1109/​DTIP.​2016.​7514827
Zurück zum Zitat Rebeiz GM (2003) RF MEMS. Theory, design, and technology. Wiley, Hoboken, p 6 (pp. 92, 228, 66) Rebeiz GM (2003) RF MEMS. Theory, design, and technology. Wiley, Hoboken, p 6 (pp. 92, 228, 66)
Zurück zum Zitat Wang Z, Liu Z, Li X (2010) A Ka-band 3-bit RF MEMS switched line phase shifter implemented in coplanar waveguide. In: 2010 10th IEEE international conference on solid-state and integrated circuit technology (ICSICT), pp 1450–1452. doi:10.1109/ICSICT.2010.5667567 Wang Z, Liu Z, Li X (2010) A Ka-band 3-bit RF MEMS switched line phase shifter implemented in coplanar waveguide. In: 2010 10th IEEE international conference on solid-state and integrated circuit technology (ICSICT), pp 1450–1452. doi:10.​1109/​ICSICT.​2010.​5667567
Zurück zum Zitat Ya ML, Soin N, Nordin AN (2014) Novel low-voltage RF-MEMS switch: design and simulation. In: 2014 IEEE international conference on semiconductor electronics (ICSE), pp 142–145. doi:10.1109/SMELEC.2014.6920816 Ya ML, Soin N, Nordin AN (2014) Novel low-voltage RF-MEMS switch: design and simulation. In: 2014 IEEE international conference on semiconductor electronics (ICSE), pp 142–145. doi:10.​1109/​SMELEC.​2014.​6920816
Metadaten
Titel
A novel design of a low-voltage low-loss T-match RF-MEMS capacitive switch
verfasst von
Li-Ya Ma
Anis Nurashikin Nordin
Norhayati Soin
Publikationsdatum
10.11.2017
Verlag
Springer Berlin Heidelberg
Erschienen in
Microsystem Technologies / Ausgabe 1/2018
Print ISSN: 0946-7076
Elektronische ISSN: 1432-1858
DOI
https://doi.org/10.1007/s00542-017-3577-4

Weitere Artikel der Ausgabe 1/2018

Microsystem Technologies 1/2018 Zur Ausgabe

Neuer Inhalt