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Formation of gold-capped silicon nanocolumns on silicon substrate

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Abstract

Gold-capped silicon nanocolumns regularly distributed over silicon substrate were obtained. The columns length was roughly 100 nm; their deviation from perpendicular axis was less than 2°. The diameter of the columns was of the order of 10 nm or below of that. The proposed procedure of nanostructuring included the following main steps: deposition of aluminum thin layer (100–500 nm) by magnetron sputtering on (100) oriented Si wafers; formation of porous self-ordered alumina structures by electrochemical anodizing of the Al film in oxalic acid; electroless inversion of Au in alumina pores; and reactive ion etching. The obtained Si–Au structures are of importance as the platforms for biosensing applications, while the gold-free structures are of interest in photovoltaics.

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Acknowledgments

The study was supported by the Lithuanian State Science and Studies Foundation (Contract No. AUT-18/2010).

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Authors and Affiliations

  1. Center for Physical Sciences and Technology, Institute of Chemistry, A. Goštauto 9, Vilnius, 01108, Lithuania

    K. Leinartas, P. Miečinskas, A. Selskis & E. Juzeliunas

  2. Applied Research Institute for Prospective Technologies, Saulėtekio 15, Vilnius, 10224, Lithuania

    V. Janušonienė, A. Galdikas & J. Ulbikas

  3. Center for Physical Sciences and Technology, Semiconductors Physics Institute, A. Goštauto 11, Vilnius, 01108, Lithuania

    A. Šetkus

  4. Center of Mechatronics, S. Daukanto 12, Panevėžys, 35212, Lithuania

    R. Kaliasas

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  1. K. Leinartas
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Correspondence to E. Juzeliunas.

Additional information

This paper is dedicated to the 65th birthday of Professor G. Inzelt.

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Leinartas, K., Miečinskas, P., Selskis, A. et al. Formation of gold-capped silicon nanocolumns on silicon substrate. J Solid State Electrochem 15, 2419–2425 (2011). https://doi.org/10.1007/s10008-011-1442-4

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  • DOI: https://doi.org/10.1007/s10008-011-1442-4

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