Abstract
The fabrication of two-dimensional terahertz photonic crystals using wet chemical etching of high-resistivity silicon is described. Wet-etched photonic crystals with a sloped sidewall were fabricated in 16 × 10 square lattices with a period of 1430 μm and a height of 150 μm, and were bonded between two parallel Au-coated silicon wafers for tight confinement in the vertical direction. The formation of a photonic band gap at a frequency of about 0.1 THz with a width of 14 GHz is demonstrated by the experimental results and the numerical simulations of the transmission frequency spectrum for the transverse magnetic mode.
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Acknowledgements
This work was supported by the Korea Electrotechnology Research Institute (KERI) funded by the Korean government’s Ministry of Knowledge Economy.
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Kim, JI., Jeon, SG., Kim, GJ. et al. Two-Dimensional Terahertz Photonic Crystals Fabricated by Wet Chemical Etching of Silicon. J Infrared Milli Terahz Waves 33, 206–211 (2012). https://doi.org/10.1007/s10762-011-9867-5
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DOI: https://doi.org/10.1007/s10762-011-9867-5