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Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O2 in an Industrial-Scale Reactor

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Abstract

Optical emission spectroscopy and mass spectrometry was used to characterize gaseous plasma in an industrial reactor of volume 5 m3 during deposition of protective coatings. Plasma was created in mixtures of hexamethyldisiloxane (HMDSO) and oxygen at the powers between 1 and 8 kW. The plasma density was somehow below 1014 m−3. The flows of both gases were varied up to 200 sccm while the effective pumping speed was adjusted by changing the roots pump rotation speed between 250 and 4000 rpm. At such conditions the HMDSO was only partially dissociated to fragments. The behaviour of optical emission lines and mass ion currents was well correlated indicating that even one single technique was sufficient to monitor the behaviour of plasma at various discharge conditions. The optical emission spectroscopy as a simple and economic method is therefore suitable for controlling key processing parameters in such a plasma reactor.

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Acknowledgements

This research was funded by Slovenian Research Agency (research core funding No. P2-0082—Thin film structures and plasma surface engineering, as well as project No. L2-8179—Evaluation of the range of plasma parameters suitable for nanostructuring of polymers on industrial scale).

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Authors and Affiliations

  1. Elvez Ltd, Ulica Antona Tomšiča 35, 1294, Višnja Gora, Slovenia

    Žiga Gosar

  2. Jozef Stefan International Postgraduate School, Jamova Cesta 39, 1000, Ljubljana, Slovenia

    Žiga Gosar

  3. Department of Surface Engineering, Jozef Stefan Institute, Jamova Cesta 39, 1000, Ljubljana, Slovenia

    Janez Kovač, Miran Mozetič, Gregor Primc, Alenka Vesel & Rok Zaplotnik

  4. Plasmadis Ltd, Teslova Ulica 30, 1000, Ljubljana, Slovenia

    Miran Mozetič, Gregor Primc, Alenka Vesel & Rok Zaplotnik

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  1. Žiga Gosar
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  2. Janez Kovač
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  3. Miran Mozetič
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  4. Gregor Primc
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Correspondence to Rok Zaplotnik.

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Gosar, Ž., Kovač, J., Mozetič, M. et al. Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O2 in an Industrial-Scale Reactor. Plasma Chem Plasma Process 40, 25–42 (2020). https://doi.org/10.1007/s11090-019-10026-5

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  • DOI: https://doi.org/10.1007/s11090-019-10026-5

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