Disk Lubricant Additives, A20H and C2: Characteristics and Chemistry in the Disk Environment

Disk lubricant additives A20H and C2 are Fomblin Z type perfluoropolyether with the hydroxyl end-group, –O–CF₂–CH₂–OH, at one end, and the cyclo-triphosphazene end-group, R₅(PN)₃–O–, at the other end. Here, R is an m-trifluoromethyl-phenoxy group for A20H and a trifluoroethoxy group for C2. These additives were examined for miscibility with benzene, spin-off rate, water contact angle, and the diffusion rate over the carbon overcoat. It is revealed that A20H adheres to the carbon overcoat spontaneously. The attractive interaction arises from the charge–transfer type interaction between the aromatic rings of the phosphazene end and the graphitic regime of the carbon overcoat. No spontaneous adherence occurs between the lubricant C2 and the carbon overcoat. A TOF-SIMS study of disks coated with A20H and C2, respectively, with and without subsequent curing by short-UV (185 nm) was performed. It is revealed: (1) if presented with a low energy electron, the phenoxy groups of A20H readily undergo the dissociative electron capture, while the trifluoroethoxy group does not, and (2) photoelectrons generated by short-UV have little kinetic energy and the electron capture occurs only if an electrophilic molecular sector is in intimate contact with the carbon. Thus, in the case of disks coated with A20H, UV-curing results in detachment of a phenoxy group in contact with the carbon, generation of a radical center at the phosphorus atom and subsequent formation of a bona fide chemical bond between the phosphor and the carbon overcoat. No reaction of consequence occurs when disks coated with C2 are irradiated with short-UV.