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Synthesis and properties of UV-curable hyperbranched polyurethane and its application in the negative-type photoresist

  • Organic Materials
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Abstract

UV-curable hyperbranched polyurethane (UV-HBPU) containing carboxyl groups was synthesized from isophorone diisocyanate (IPDI), diethanolamine (DEOA), polyethylene glycol (PEG-400), hydroxyethyl acrylate (HEA), and 2,2-bis (hydroxymethyl) propionic acid (DMPA). The UV-HBPU was used as a negative-type photoresist for a printed circuit board (PCB). Fourier-transform infrared spectroscopy (FTIR) and proton nuclear magnetic resonance (1HNMR) spectroscopy of UV-HBPUs indicated that the synthesis was successful. Differential scanning calorimetry (DSC) and thermogravimetric analysis (TGA) showed that the thermal stability of the UV-HBPUs decreased as the HEA content increased. The polymer exhibited excellent photoresist properties, and the resolution of circuits based on this negative-type photoresist reached 10 μm.

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Authors and Affiliations

  1. School of Chemical and Material Engineering, Jiangnan University, Wuxi, 214122, China

    Jingcheng Liu  (刘敬成), Licheng Lin, Xiuli Jia, Ren Liu, Shengwen Zhang & Xiaoya Liu  (刘晓亚)

Authors
  1. Jingcheng Liu  (刘敬成)
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  2. Licheng Lin
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  3. Xiuli Jia
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  4. Ren Liu
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  5. Shengwen Zhang
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  6. Xiaoya Liu  (刘晓亚)
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Corresponding author

Correspondence to Xiaoya Liu  (刘晓亚).

Additional information

Funded by the National Natural Science Foundation of China (Nos. 51203063, 51103064)

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Liu, J., Lin, L., Jia, X. et al. Synthesis and properties of UV-curable hyperbranched polyurethane and its application in the negative-type photoresist. J. Wuhan Univ. Technol.-Mat. Sci. Edit. 29, 208–212 (2014). https://doi.org/10.1007/s11595-014-0894-7

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  • DOI: https://doi.org/10.1007/s11595-014-0894-7

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