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Journal of Materials Engineering and Performance
Erschienen in: Journal of Materials Engineering and Performance 10/2016

24.08.2016

Effect of pH on the Electrochemical Behavior of Tantalum in Borate Buffer Solutions

verfasst von: F. R. Attarzadeh, N. Attarzadeh, S. Vafaeian, A. Fattah-Alhosseini

Erschienen in: Journal of Materials Engineering and Performance | Ausgabe 10/2016

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Abstract

In this research, various electrochemical methods were used to investigate the electrochemical behavior of tantalum in borate buffer solutions of various pH values, ranging from 9.0 to 6.5. Potentiodynamic polarization curves revealed that tantalum showed excellent passive behavior in borate buffer solutions. The potentiodynamic polarization and electrochemical impedance spectroscopy results showed that the passive film formed on tantalum offered its best protective behavior when the pH is 8.0, with the passivity undergoing a drastic change as the pH moved toward higher values. The semiconductive behavior of the passive films formed on tantalum was investigated by employing Mott-Schottky analysis in conjunction with a point defect model. The results indicated that the passive film exhibited n-type semiconductive behavior and that donor densities were in the range of 1.958-7.242 × 1020 cm−3. Moreover, this analysis showed that the donor density and flat band potential were quite sensitive to the pH.
Vorheriger Artikel The Effect of Surface Patterning on Corrosion Resistance of Biomedical Devices
Nächster Artikel Sliding Wear Behavior of TiC-Reinforced Cu-4 wt.% Ni Matrix Composites

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Metadaten
Titel
Effect of pH on the Electrochemical Behavior of Tantalum in Borate Buffer Solutions
verfasst von
F. R. Attarzadeh
N. Attarzadeh
S. Vafaeian
A. Fattah-Alhosseini
Publikationsdatum
24.08.2016
Verlag
Springer US
Erschienen in
Journal of Materials Engineering and Performance / Ausgabe 10/2016
Print ISSN: 1059-9495
Elektronische ISSN: 1544-1024
DOI
https://doi.org/10.1007/s11665-016-2295-x

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