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Preparation and characterization of nanostructured copper bismuth diselenide thin films from a chemical route

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Abstract

Thin films of copper bismuth diselenide were prepared by chemical bath deposition technique ontoglass substrate below 60°C. The deposition parameters such as time, temperature of deposition and pH of the solution, were optimized. The set of films having different elemental compositions was prepared by varying Cu/Bi ratio from 0·13–1·74. Studies on structure, composition, morphology, optical absorption and electrical conductivity of the films were carried out and discussed. Characterization includes X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive X-ray analysis (EDAX), absorption spectroscopy, and electrical conductivity. The results are discussed and interpreted.

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Acknowledgements

The authors are thankful to Head, Department of Physics and Principal, Pratap College, Amalner, for providing laboratory facilities for this work.

The authors are grateful to Dr Ajay Gupta, Centre Director, IUC, Indore, for giving consent for completing part of this work at the consortium. One of the authors (RHB) acknowledges the University Grants Commission, Western Region, Pune, for the award of a teacher fellowship under the 10th plan.

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Authors and Affiliations

  1. P.G. Department of Physics, Pratap College, Amalner, 425 401, India

    R H BARI & L A PATIL

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  1. R H BARI
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  2. L A PATIL
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Correspondence to L A PATIL.

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BARI, R.H., PATIL, L.A. Preparation and characterization of nanostructured copper bismuth diselenide thin films from a chemical route. Bull Mater Sci 33, 663–670 (2010). https://doi.org/10.1007/s12034-011-0147-8

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  • DOI: https://doi.org/10.1007/s12034-011-0147-8

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