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Correlation Between 3-D Surface Topography and Different Deposition Times of Engineered Ni@a-C:H Thin Films

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Abstract

This study is aimed at analyzing the surface micromorphology of amorphous hydrogenated carbon layers containing nickel nanoparticles (Ni-NPs@a-C:H) within their structure, which were sputtered by co-deposition of RF-Sputtering and RF-PECVD method from acetylene gas and nickel target on glass substrates. Prepared films were then used as research material following their deposition time at three different times of 3, 7 and 13 minutes. Series of height samples were taken with the help of atomic force microscopy (AFM) operating in a non-contact mode and examined in order to determine their surface engineering characteristics. The analysis of 3-D surface texture helps to understand their essential characteristics and their implications as well as graphicalmodels and their implementation in computer simulation.

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Authors and Affiliations

  1. Faculty of Computer Science and Materials Science, Institute of Informatics, Department of Biomedical Computer Systems, University of Silesia, Bȩdzińska 39, 41-205, Sosnowiec, Poland

    Dominika Konsek & Sebastian Stach

  2. The Directorate of Research, Development and Innovation Management (DMCDI), The Technical University of Cluj-Napoca, Constantin Daicoviciu Street, no. 15, Cluj-Napoca, 400020, Cluj County, Romania

    Ştefan Ţălu

  3. Young Researchers and Elite Club, Kermanshah Branch, Islamic Azad University, Kermanshah, Iran

    Sirvan Naderi

  4. Young Researchers and Elite Club, Arak Branch, Islamic Azad University, Arak, Iran

    Ali Arman

Authors
  1. Dominika Konsek
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  2. Sebastian Stach
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  3. Ştefan Ţălu
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  4. Sirvan Naderi
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  5. Ali Arman
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Corresponding authors

Correspondence to Ştefan Ţălu or Ali Arman.

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Neither author has a financial or proprietary interest in any material or method mentioned.

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The authors declare that they have no competing interests.

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Konsek, D., Stach, S., Ţălu, Ş. et al. Correlation Between 3-D Surface Topography and Different Deposition Times of Engineered Ni@a-C:H Thin Films. Silicon 10, 2141–2151 (2018). https://doi.org/10.1007/s12633-017-9743-6

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  • DOI: https://doi.org/10.1007/s12633-017-9743-6

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