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Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid

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Abstract

Molecular glass resist has been considered as one of the best choices for a new generation of lithography. In this work, a new type of photoactive compound was obtained by the esterification of tannic acid with 2-diazo-1-naphthoquinone-4-sulfonyl chloride(2,1,4-DNQ-Cl) and ditertbutyl dicarbonate. The new obtained compound possessed both a photosensitive group of diazonaphthoquinone sulfonate(2,1,4-DNQ) and a group of acidolytic protection. Upon the irradiation of the compound under 365 nm light, the former group was photolyzed and converted into indene carboxylic acid along with a small amount of sulfonic acid, which could lead to the deprotection of the latter group. As a result, a novel i-line molecular glass photoresist was formed with the chemical modification of tannic acid. The experimental results show that the modificated compound had a fair solubility in many organic solvents. The lithographic performance of the resist was evaluated on an i-line exposure system with high photosensitivity and resolution as well.

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Authors and Affiliations

  1. Beijing Key Laboratory of Energy Conversion and Storage Materials, College of Chemistry, Beijing Normal University, Beijing, 100875, P. R. China

    Qi Wei & Liyuan Wang

Authors
  1. Qi Wei
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  2. Liyuan Wang
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Corresponding author

Correspondence to Liyuan Wang.

Additional information

Supported by the National Basic Research Program of China(No.2013CBA01703) and the National Science and Technology Major Projects of China(No.2010ZX02303).

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Wei, Q., Wang, L. Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid. Chem. Res. Chin. Univ. 31, 585–589 (2015). https://doi.org/10.1007/s40242-015-5016-3

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  • DOI: https://doi.org/10.1007/s40242-015-5016-3

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