Elsevier

Thin Solid Films

Volumes 281–282, 1 August 1996, Pages 239-242
Thin Solid Films

V1−xMoxO2 thermochromic films deposited by reactive magnetron sputtering

https://doi.org/10.1016/0040-6090(96)08641-5Get rights and content

Abstract

Thin films of V1−xMoxO2 (x=0–0.041) for thermochromic windows were formed by dual-target reactive magnetron sputtering. The composition, crystal structure, morphology and optical properties of the films were evaluated by Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD), atomic force microscopy (AFM) and spectrophotometry respectively. The relationship between the transition temperature τc and x in V1−xMoxO2 was clarified through precise determinations of the dopant concentration and the value of τc. A linear reduction in τc by approximately −12°C (at.% Mo)−1 was confirmed for the films with least doping, while the reduction efficiency decreased with higher dopant concentrations. V1−xMoxO2 films with desired x values were also fabricated using a V−Mo (Mo, 4.0 at.%) alloy target. Investigations of the thermochromism of the V1−xMoxO2 films suggest their potential for advanced windows.

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