An analytical reflection and emission UHV surface electron microscope

doi:10.1016/0304-3991(85)90177-9

Ultramicroscopy

Volume 17, Issue 1, 1985, Pages 57-65

https://doi.org/10.1016/0304-3991(85)90177-9 Get rights and content

Abstract

An UHV surface electron microscope is described which allows the study of surfaces under vacuum conditions common in surface science with the following techniques: LEERM; LEED; photo, thermionic, secondary emission microscopy; absolute micro area work function measurements. In particular, the first LEERM of Mo(110) and Si(111) surfaces are presented. They show monoatomic steps with high contrast due to Fresnel diffraction and structural differences, respectively. Condensed silver crystallites are imaged. Gold adsorption layers on Si(111) show strong contrast in photoemission; the layer thickness is deduced from LEED.

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Citation Excerpt :
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An analytical reflection and emission UHV surface electron microscope

Abstract

Ultramicroscopy

Surface Sci.

Ultramicroscopy