Elsevier

Thin Solid Films

Volume 305, Issues 1–2, August 1997, Pages 191-195
Thin Solid Films

Optical and structural properties of reactive ion beam sputter deposited CeO2 films

https://doi.org/10.1016/S0040-6090(97)00081-3Get rights and content

Abstract

Optical and structural properties of reactive ion beam sputter deposited CeO2 films as a function of oxygen partial pressures (PO2) and substrate temperatures (Ts) have been investigated. The films deposited at ambient temperature with PO2 of 0.01 Pa have shown a refractive index of 2.36 which increased to 2.44 at 400 °C. Refractive index and extinction coefficient are sensitive up to a Ts of ∼ 200 °C. Raman spectroscopy and X-ray diffraction (XRD) have been used to characterise the structural properties. A preferential orientation of (220) was observed up to a Ts of 200 °C and it changed to (200) at 400 °C and above. Raman line broadening, peak shift and XRD broadening indicate the formation of nanocrystalline phase for the films deposited up to a substrate temperature of 300 °C. However, crystallinity of the films were better for Ts values above 300 °C. In general both optical and structural properties were unusual compared to the films deposited by conventional electron beam evaporation, but were similar in some aspects to those deposited by ion-assisted deposition. Apart from thermal effects, this behavior is also attributed to the bombardment of backscattered ions/neutrals on the growing film as well as the higher kinetic energy of the condensing species, together resulting in increased packing density.

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