Elsevier

Thin Solid Films

Volumes 308–309, 31 October 1997, Pages 113-117
Thin Solid Films

Superhard coatings of CNx/ZrN multilayers prepared by DC magnetron sputtering

https://doi.org/10.1016/S0040-6090(97)00429-XGet rights and content

Abstract

CNx/ZrN multilayers were prepared by a dual-cathode unbalanced DC magnetron sputtering system. The results showed that under proper deposition conditions, the multilayer coatings were dense and fully crystalline with hardness exceeding 40 GPa and elastic modulus over 400 GPa. X-ray diffraction studies showed that there is a strong correlation between coating hardness and the occurrence of (111) texture of ZrN. Some crystalline regions going through the multilayers were clearly observed from the cross-sectional high resolution transmission electron microscopy image. Two extra d-spacings were obtained from the diffraction pattern that do not belong to any known d-spacing for ZrN, but match with two calculated d-spacings for β-C3N4.

Introduction

β-C3N4 has attracted much attention since 1989 due to the prediction that its mechanical properties are similar to those of diamond 1, 2. Numerous attempts have been made to synthesize this material 3, 4, 5, 6, 7, 8, 9, 10. Plasma-based thin film deposition techniques were most frequently used due to the possibility of obtaining and controlling growth conditions far beyond equilibrium. Some researches reported the growth of amorphous films with embedded crystalline β-C3N4 8, 9.

However, most of the results showed that the nitrogen content of these films was 20-45 at.%, substantially below the stoichiometric composition for β-C3N4 (~ 57 at.%). The hardness was mainly in the range of 10–25 GPa. One investigation reported hardness up to 60 GPa [11].

Pseudomorphic stabilization was recently proposed as a means to produce crystalline carbon nitride using CNx/TiN multilayers as a test case 12, 13. TiN was chosen as a template substrate because of the good lattice match between TiN (111) and β-C3N4 (0001). The best CNx/TiN multilayers are fully crystalline, with hardness up to 55 GPa. In this paper, we explore the same strategy by using ZrN as the sandwiching materials. Note that ZrN (111), (a=0.323 nm) has hexagonal symmetry, the same as β-C3N4 (0001), (a=0.644 nm), and the lattice mismatch between these two faces is within 0.5%. We will examine the significance of having ZrN (111) texture in improving the overall hardness of the CNx/ZrN multilayers.

Section snippets

Experimental

The dual-cathode unbalanced magnetron sputtering apparatus described in an early publication [14]was used to deposit the CNx/ZrN multilayers. The substrates (Si (100) wafers and polished M1 steel) were mounted on a turntable between two targets, zirconium and graphite. The rotational speed of the turntable was varied to control the individual thickness of the CNx and ZrN layers. The base pressure was about 2×10−6 Torr, and the operating pressure, consisting of argon and nitrogen, was set at 8

Hardness vs. deposition parameters

The hardness of CNx/ZrN multilayers is a strong function of process parameters, i.e. nitrogen partial pressure, target powers, substrate bias, and substrate turntable rotation speed. Fig. 1Fig. 2Fig. 3 show a series of process parameter effects on nanoindentation hardness of CNx/ZrN multilayers. These data demonstrate that the maximum hardness can be obtained at an intermediate nitrogen pressure (0.4–0.5 mTorr), high substrate rotation speed (20–24 rev./min) and high substrate bias (180 V). Our

Conclusion

CNx/ZrN multilayers were deposited by a dual-cathode DC magnetron sputtering system. Under optimum process conditions, the multilayers are dense and fully crystalline with maximum hardness of 40–45 GPa and modulus >400 GPa. X-ray diffraction studies demonstrate a strong correlation between the coating hardness and the ZrN (111) texture. High resolution electron microscopy shows that the carbon nitride regions are crystalline. Diffraction studies reveal two new d-spacings that cannot be

Acknowledgements

This research is sponsored by AFOSRJNA, Grant No. F49620–95–1–0384 (program manager: Dr. A. Pechenik). Nanoindentation and structural studies were supported by the NSF, Grant No. CMS-9520636 (program manager: Dr. Larsen-Basse). We wish to thank J. Wessling for assistance in sputter-deposition.

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Cited by (0)

1

Present address: IBM, Hopewell, NY, 12533, USA.

2

Present address: Sputtered Films, Inc., 320 Nopal St., Santa Barbara, CA 93103, USA.

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