Effect of oxidation on structural, optical and electrical properties of CdS thin films grown by sputtering
Introduction
In recent years, extensive research has been carried out on the area of preparation and characterization of CdS thin films due to its application in different type of most promising photovoltaic solar cells such as CdTe [1], CZTS [2] and CIGS [3]. CdS is the group II – VI compound semiconductor with a direct optical band gap of around 2.45 eV, and CdS/CdTe, CdS/CZTS or CdS/CIGS contact is the energy converting interface in the among solar cells [4], [5]. The light is transmitted through the n-type CdS layer to the p-type absorber layer and the photogenerated electron-hole pairs are divided in the depletion region of the CdS/CdTe, CdS/CZTS or CdS/CIGS heterojunction. Moreover, CdS thin film in a solar cell structure does not just act as a window layer, but contribute to carrier generation due to its high photosensitivity [6], [7]. Therefore, the optical, structural and electrical properties of the CdS layers can influence the characteristics of CdS/CdTe, CdS/CZTS or CdS/CIGS heterojunction interface and consequently, the performance of the whole cells [8].
In this work, CdS thin films are oxidized by thermal annealing in an attempt to increase its band gap for efficient, stable and low-cost solar cells. The structural, optical and electrical properties of annealed CdS thin films have been analyzed by XRD, EDX, FTIR analysis, UV–vis spectrometry and Hall Effect measurement.
Section snippets
Experimental
Commercially available FTO coated soda lime glass substrates were used to deposit CdS thin films. Substrates were degreased by ethanol–acetone–ethanol and then dried by dry N2. CdS layers of 150 nm were deposited by sputtering at a substrate temperature 300 °C and 30 W of RF power with 18 mTorr Ar pressure. The prepared films were annealed to oxidize in a vacuum furnace at 350 °C for 15, 30 and 45 min. The chamber pressure maintained in the range 300 – 320 Torr by continuous N2:O2 (99:1) gas flow as
Results and discussions
Fig. 1 shows the X-ray diffraction patterns for films oxidized at 350 °C for 30 min (sample 3) and 45 min (sample 4) in oxygen ambient. Examining the Fig. 1, it is observed that for the oxidized films, the XRD reflections peaks are corresponding to the CdS hexagonal phase (JCPDS 01-077-2306), where, the additional reflection peaks corresponding to the CdO:CdSO4, (JCPDS 00-026-0382) phases are also observed. The film annealed for 30 min is found in (0 0 2) hexagonal phase oriented but, once the
Conclusion
The CdS thin films are oxidized by thermal annealing in oxygen ambient and the resultant films properties are extensively studied in this work. XRD patterns indicate that the resulting films show mixed structure with CdS and CdO phases, which may be described as CdS – CdSO4 – CdO. However, it is confirmed that O2 is substituted into the CdS lattice, from FTIR studies. It has been found that the oxidization of CdS by thermal annealing in oxygen ambient increases its band gap by incorporating
Acknowledgment
This work is supported by NPST Program through King Saud University (KSU) with research grant code 10-ENE-1039-02. Authors would also like to acknowledge the Solar Energy Research Institute (SERI) of The National University of Malaysia (UKM) for other supports.
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