Effect of substrate temperature on the crystal growth orientation of SnO2:F thin films spray-deposited on glass substrates
Introduction
The highly transparent and conductive thin films, owing to its high transmittance and conductivity, have been wide device applications [1]. Thin films of non-stiochiometric metal oxides like tin oxide; indium oxide; zinc oxide and their alloy when deposited under appropriate conditions and doped suitably impurities for well-suited applications are optically transparent as well as electrically conducting. SnO2, has a tetragonal structure, similar to the rutile structure with the wide energy gap of Eg = 3.67 eV, and behaves as an n-type semi-conductor [2] have been widely used in different devices like solar cells as transparent and protective electrodes [3], flat panel collectors as spectral selective windows [4], sensors for detection of gases [5], [8], and photo-thermal converters, providing thermal insulation for houses [6].
Fluorine doped tin oxide (SnO2:F) has been prepared by several methods: Magnetron sputtering [7], reactive evaporation [8], chemical vapor deposition [9] and spray pyrolysis [10]. These spray pyrolyses are well-suited for the preparation of doped tin oxide thin films because of its simple and inexpensive experimental arrangement, ease of adding various doping materials, reproducibility, high growth rate and mass production capability for uniform large area coatings [11].
The optical and structural properties of spray deposited SnO2:F films have also been well studied, perhaps because of greater interest in this direction. As there is an increasing demand for these materials in the optoelectronic devices, there is a need to understand the transport properties of doped SnO2 thin films. As far as devices are concerned, the highest reported photovoltaic conversion efficiency for spray deposited SnO2 based Si solar cell is 12.3% [12]. In this paper, the effects of substrate temperature on the crystal growth orientation of SnO2:F thin films are studied by X-ray diffraction in detail, and the changes of optical and electrical properties with growth orientation are also studied. The prime aim of this work is to produce highly conducting F doped tin oxide thin films from SnCl2 precursor solution and to investigate their structural and electrical properties.
Section snippets
Experimental
Fluorine doped tin oxide (SnO2:F) films were prepared using homemade spray pyrolysis experimental instruments in the open environment. The dihydrate stannous chloride (SnCl2·2H2O) was used as the source for tin. The fluorine doping was achieved using ammonium fluoride (NH4F) [13]. Low-iron glasses (100 × 100 × 3.2 mm) were used as substrates. The substrates were cleaned using distilled water and ethanol. The substrate temperature was varied from 250 °C to 600 °C. Films of about 1 um thick were grown.
Results
We employed the X-ray diffraction technique to get a first impression of the main crystalline phases and the possible orientation of crystallites in the films prepared at different conditions. The X-ray diffraction spectra of SnO2:F films prepared at 30 s spraying time and at 250, 300, 400, 500 and 550 °C substrate temperature on low-iron glasses are shown in Fig. 1. The plots in Fig. 1 give an obvious overview of the changes in relative peak intensities corresponding to the different crystal
Structure analysis
The structural characterization is very important in explaining the optical and electrical properties of SnO2:F thin films. The crystal structure of the as-deposited SnO2:F thin films were determined by X-ray diffraction technique. The XRD patterns obtained for the films grown on glass substrates at different substrate temperature were studied in the 2θ range of 10 to 70° and are depicted in Fig. 1. The matching of observed and standard d values confirms that the deposited films are of SnO2
Conclusions
Spray pyrolysis is a cost effective method used in preparing highly conductive SnO2:F films, having high transparency. Structural investigations using XRD reveal that the layer is composed of polycrystalline SnO2 with a tetragonal crystal structure only. The lattice parameter values are not affected by the doping. The preferred orientation depended on substrate temperature, which is in (200) direction in the SnO2:F deposited at the substrate temperature of > 300 °C. The lowest sheet resistance of
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