Elsevier

Optics & Laser Technology

Volume 75, December 2015, Pages 132-137
Optics & Laser Technology

Nonlinear optical properties of methyl red under CW irradiation

https://doi.org/10.1016/j.optlastec.2015.06.031Get rights and content

Highlights

  • Methyl red (MR) doped PMMA is investigated by using Z-scan at different wavelengths.

  • n2 and Δn are obtained under different scanning speed at 473 nm and 532 nm.

  • We compare the results of CW Z-scan and pulse Z-scan at 532 nm.

  • The cumulative thermal effect has great influence to the NLO properties of MR.

Abstract

Organic materials have wide potential application in nonlinear optical devices. The nonlinear optical (NLO) properties of methyl red (MR) doped polymethyl methacrylate (MR-PMMA) are investigated under CW laser irradiation at 473 nm, 532 nm and 632.8 nm, respectively. By combining Kramers–Kronig (K–K) relation and CW Z-scan technique, the effective refractive index n2 and the change of refractive index Δn are obtained under different scanning speed at 473 nm and 532 nm. Δn is positive at 473 nm, while Δn is negative at 532 nm. The experimental result is consistent with that of K–K relation. With the scanning speed decreasing, the NLO properties of MR-PMMA are enhanced. With different laser powers at 632.8 nm, MR-PMMA has only nonlinear absorption rather than nonlinear refraction. Meanwhile, the sample is investigated under pulse laser irradiation at 532 nm. Through the comparison of results of CW Z-scan and pulse Z-scan, the influence of the cumulative thermal effect on NLO properties of material is investigated. The results indicate that, under CW irradiation near the absorption peak wavelength, the cumulative thermal effect has great influence to the NLO properties of MR-PMMA.

Introduction

The organic photochromic materials have the advantage that the optical properties will change under the irradiation of light with a certain wavelength instead of external electric field and magnetic field. Hence the materials can be used to process optical signal [1]. Under CW irradiation, organic photochromic materials have the wide potential application in optoelectronic field. For example, ethyl red doped polymer film has potential application in optical switching [2], and disperse red doped polymethyl methacrylate (PMMA) constitutes a demonstrator of an optically controlled integrated optical device [3].

Methyl red (MR) is an azobenzene organic photochromic material [4]. The structure character of azobenzene is double-bond N=N between the two phenyls [5]. Because the structure has active photochemical property, azobenzene can generate trans and cis isomerization easily by light irradiation, which is so-called photoisomerization. Some azobenzene studies have shown that the trans-cis configuration changes are an effective mechanism for creating large optical nonlinearities [6], which benefits application development. However under CW irradiation, the cumulative thermal effect has powerful influence on NLO properties of materials [6]. Hence, the influence of the cumulative thermal effect on NLO properties of materials is worthy of further investigations for potential applications. In this paper, we use CW Z-scan to investigate the influence at 473 nm and 532 nm under different scanning speed and at 632.8 nm with different laser powers. Through the comparison of results of CW Z-scan and pulse Z-scan at 532 nm, the order of magnitudes of the influence is investigated.

Section snippets

Experiment

The sample, MR-doped PMMA thin film, is prepared as follows: MR and PMMA were dissolved in cyclohexanone to form a uniform solution. Subsequently, the solution was stirred well for two hours using a magnetic stirrer. The mixed solution was dried into the viscous solution at room temperature. The viscous solution was spread by spin-coating on a glass slide. Last step, the sample was dried in an oven for 10 h. In the sample, MR is dominant to occur nonlinear effect, and the nonlinear effect of

Results and discussion

The linear absorption spectra of the sample A, at steady state and excited state, are shown in Fig. 4. The peak of the measured absorption spectrum is located at 497 nm.

K–K relation describes the spectral dependence of the absorption and the change of refractive index Δnk [14]. For this reason, we utilize the K–K relation to calculate Δnk of the sample at various wavelengths through the steady-state and excited-state absorption spectra which are excited by 473 and 532 nm CW laser. The Δnk can be

Conclusion

Based on CW Z-scan technique, the normalized nonlinear refraction and absorption curves are determined at 473 nm, 532 nm and 632.8 nm respectively. The result of Z-scan indicates that MR-PMMA has a larger optical nonlinearity under CW irradiation compared with MR-PMMA under pulse irradiation: n2 of MR-PMMA is about 1.031×109m2W1 under 532 nm CW irradiation, while MR-PMMA has n2=2.909×1013m2W1 under 532 nm pulse irradiation. The sign of Δn measured by the Z-scan technique is consistent with the

Acknowledgments

The authors thank the Chinese National Key Basic Research Special Fund (Grant 2011CB922003), the National Natural Science Foundation of China (Grants 61475078 and 61405097), the Science and Technology Program of Tianjin (Grants 15JCQNJC02300 and 15JCQNJC02600) and The International Science & Technology Cooperation Program of China (Grant 2013DFA51430).

References (18)

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