Elsevier

Organic Electronics

Volume 6, Issue 2, April 2005, Pages 78-84
Organic Electronics

PMMA–Ta2O5 bilayer gate dielectric for low operating voltage organic FETs

https://doi.org/10.1016/j.orgel.2005.03.002Get rights and content

Abstract

This paper reports on a study on pentacene field effect transistors (OFETs) with a gate dielectric made of a bilayer PMMA/Ta2O5 where PMMA (poly(methyl methacrylate)) is spin-coated on top of an evaporated layer of Ta2O5. A comparison with devices with only Ta2O5 is presented. These latter exhibit very low operating voltage associated to the high dielectric constant of this oxide but also show some surface trapping and gate leakage. These two drawbacks can be overcome by depositing a PMMA layer on Ta2O5. With such a bilayer gate dielectric, gate leakage current is considerably reduced and the quality of the interface between pentacene and PMMA was much improved compared to that with Ta2O5 as evidenced from the much higher output drain current. The influence of PMMA thickness in the range 15–250 nm is presented. OFETs with field effect mobility, on/off current ratio, and sub-threshold slope of respectively 0.4 cm2 V−1 s−1, 3 × 105 and 1.2 V/decade were obtained.

Introduction

This last decade, organic field effect transistors have gained much interest mainly due to their potential applications in what is commonly called large area electronics. These include driving circuits for future all-organic OLEDs flat panel displays [1], plastic RF–ID circuits [2], gas sensors [3], chemical species sensors [4]. The continuous improvement in the quality of organic semiconductors, their compatibility with plastic substrates [5], [6], and their low cost and low temperature process make them good candidates for all these applications. Nevertheless OFETs performances do not rely only on the semiconductor material quality as intrinsic mobility. OFETs are working in accumulation regime and most of the modulated charge lies within the first 10 nm. That does mean that the interface properties between the semiconductor and the gate dielectric are of tremendous importance on the field effect mobility. Improvement of the gate dielectric material and of its interface with the organic semiconductor would be highly beneficial to the performances of OFETs. Roughness [7], density of surface traps [8], dielectric constant [9] are crucial parameters. Among inorganic dielectrics, the most often used was SiO2 grown on highly doped Si gate. However its weak dielectric constant (ε = 3.9) remains a serious limitation for low power and nomad applications since operating voltage largely above 50 V are necessary for sufficient charge injection in the channel. Replacement with silicon nitride does not lead to significant improvement [7]. High-K materials such as Al2O3 [9], [10] and Ta2O5 [11], [12] were also proposed for gate oxide in OFETs. This latter reference reports on an investigation on the influence of electric field and temperature on mobility of pentacene transistors with Ta2O5 grown by anodic oxidation on plastic substrates. The mobility and on/off ratio obtained in this study are competitive with typical results for this materials combination (0.36 cm2 V−1 s−1 and 104, respectively). It is commonly observed that the operating voltage was noticeably reduced with Ta2O5, but this dielectric remains somewhat leaky. Other studies proposed to realise all-organic transistors with the use of polymer dielectrics as polyvinyl phenol (PVP) based polymers [13], [14] or PMMA [15], [16]. One major advantage of organic–organic interface is the noninteracting nature of this interface in most cases [17]. That means an abrupt interface without reactive interlayer or dipoles as observed in metal/organic interfaces [18]. The organic/oxide interface is also highly dependent on the surface preparation of the oxide as the numerous studies on the influence of ITO surface treatment on OLEDs performances shown in the past [19]. In spite of the potential improvement of device operation with organic/organic interface, organic dielectrics also show the drawback of a small dielectric constant. In order to reconcile the respective advantages of an high-K oxide for low operating voltage and polymer dielectric for a better interface with the organic semiconductor, a bilayer gate dielectric consisting of a Ta2O5 film covered with a PMMA film is reported in this study.

Section snippets

Experimental

Ta2O5 (purchased from Cerac Inc.) was deposited by e-beam evaporation in presence of an oxygen partial pressure (8 × 10−5–2 × 10−4 mbar) on highly doped Si substrate kept at room temperature. The deposition rate and the film thickness were respectively 5 Å/s and 120 nm. Some films have been annealed at 600 °C for 1 h in O2 atmosphere. For the bilayer gate dielectric, a solution of PMMA in anisole was spin-coated onto the Ta2O5 and allowed to dry at 120 °C for 1 min. The thickness of PMMA after drying is

Electrical properties of evaporated Ta2O5

It is well known that the performances of a MOSFET strongly rely on the structural and electronic qualities of the gate insulator. Ta2O5 deposited by reactive evaporation at room temperature may contain several defects which could degrade the electrical characteristics of the OFET: multiphase material, local variation of composition, inhomogeneity, roughness, bulk and surface traps. We then investigated different deposition conditions by varying the oxygen pressure, the substrate temperature

Conclusions

In this paper we reported a new gate dielectric for OFETs made of a PMMA/Ta2O5 bilayer. This dielectric design combines the respective advantages of the two materials, say, the high dielectric constant of Ta2O5 and an improved PMMA/pentacene interface. Devices with operating voltages in the range 0–2.5 V were obtained with Ta2O5 dielectric constant (εr  20). Devices showing a high mobility, a high on/off ratio and very low leakage current were obtained with PMMA spun on Ta2O5. Optimum PMMA

Acknowledgements

This study benefited from a financial support of French Research Ministry under the program Nanosciences 2003. The technical assistance of P. Cremillieu is warmly acknowledged.

References (20)

  • H. Sirringhaus et al.

    Synth. Met.

    (1999)
  • J.H. Lee et al.

    Synth. Met.

    (2003)
  • L.A. Majewski et al.

    Organic Electronics

    (2003)
  • C. Bartic et al.

    Organic Electronics

    (2002)
  • S. Uemura et al.

    Thin Solid Films

    (2003)
  • L.S. Hung et al.

    Mater. Sci. Eng. Rep.

    (2002)
  • P.F. Baude et al.

    Appl. Phys. Lett.

    (2003)
  • B. Crone et al.

    Appl. Phys. Lett.

    (2001)
  • C. Bartic et al.

    Appl. Phys. Lett.

    (2003)
  • A. Bonfiglio et al.

    Appl. Phys. Lett.

    (2003)
There are more references available in the full text version of this article.

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