Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering
Introduction
Titanium nitride is one of the best investigated and commercially long-established hard coatings deposited by CVD (chemical vapour deposition) or PVD (physical vapour deposition) methods. The application of this coating ranges from tool coatings, diffusion barriers in the semiconductor industry to decorative coating of numerous consumer goods based on its golden colour. One disadvantage of TiN is its low oxidation resistance [1]. But this can be improved by alloying TiN with a third element, e.g. Al, Cr, Si etc. [1], [2], [3], [4], [5], [6]. Simultaneously, the alloying elements influence the colour of TiN [7]. By means of a variation of the concentration of the alloying element and the nitrogen content the colour and oxidation resistance of TiN can be directly influenced. The discovery of new colours for hard coatings is commercially interesting because of the limited colour palette available with respect to bulk colours. The aim of the present study is to investigate the change of some properties (e.g. colour, oxidation resistance, hardness) of TiN through the alloying with magnesium systematically.
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Experimental details
All depositions were carried out in a Leybold L560 UV vacuum system. Two magnetron sputter cathodes and a rotating substrate holder were used for the (Ti,Mg)N deposition. The purity of the Ti and the Mg target was 99.9 %. The rotation speed of the substrate holder was fixed at 135 rpm, so that no complete atomic layer could grow on the substrate per rotation. This led to a complete mixture of the metallic components in the coating. Further details about the deposition parameters can be found in
Results and discussion
The chemical composition of the (Ti1−xMgx)N coatings was measured by EDX. The Mg content of the coatings was in the range of x = 0 to x = 0.67 (0–35 at.−%) when varying the power on the Mg cathode between 0 and 100 W (see Table 2). At the same time, the nitrogen content decreased a little bit with increasing Mg content (from 57 at.−% to 48 at.−%). The morphology of the coatings was columnar (e.g. Fig. 1) and changed to non-columnar only for the highest Mg content (Fig. 2). The crystallographic
Conclusions
(Ti1−xMgx)N coatings could be successfully deposited onto high speed steel (HSS) and glass substrates using reactive dc magnetron sputtering. The following conclusions can be drawn from the investigations:
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The morphology of (Ti1−xMgx)N coatings is columnar up to a Mg content of 24 at.−%. No columnar structure could be observed in coatings with 35 at.−% of Mg.
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XRD peaks of the coatings are shifted to lower 2θ values with increasing Mg content due to a change in the lattice parameters. It is
Acknowledgements
This work was supported by the German Research Foundation under grant no. FE 613/1-1. The authors would like to thank R. Bretzler, L. Schmalz and K. Petrikowski (FEM) for performing different characterisation tests.
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