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Device patterning of PZT/Pt/Ti/thin films on SiO2/Si3N4 membrane by a chemical wet etching approach

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Journal of Materials Science Letters

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References

  1. V. V. LEMANOV, YU, V. FROLOV, A. A. IOFAN and V. K. YARMARKIN, Microelectronic Eng. 29 (1995) 37.

    Google Scholar 

  2. M. P. POOR, A. M. HURD, C. B. FLEDDERMANN and A. Y. WU, MRS Symp. Porc. 200 (1990) 211.

    Google Scholar 

  3. H. MACÉ, H. ACHARD and L. PECCOUD, Microelectronic Eng. 29 (1995) 45.

    Google Scholar 

  4. C. H. CHOU and J. PHILIPS, J. Appl. Phys. 68(5) (1990) 2415.

    Google Scholar 

  5. W. J. YOO, J. H. HAHM, H. W. KIM, C. O. JUNG, Y. B. KOH and M. Y. LEE, Jpn. J. Appl. Phys. Part 1 35(4B) (1996) 2501.

    Google Scholar 

  6. J. L. VOSSEN and W. KERN, “Thin Film Processes,” 1st ed., part V-1 (Academic Press, New York, 1978).

    Google Scholar 

  7. D. SPORN, S. MERKLEIN, W. GROND, S. SEIFERT, S. WAHL and A. BERGER, Microelectronic Eng. 29 (1995) 161.

    Google Scholar 

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Liu, W., Ko, J. & Zhu, W. Device patterning of PZT/Pt/Ti/thin films on SiO2/Si3N4 membrane by a chemical wet etching approach. Journal of Materials Science Letters 19, 2263–2265 (2000). https://doi.org/10.1023/A:1006745428656

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  • DOI: https://doi.org/10.1023/A:1006745428656

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