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Thermal Plasma Technology: Where Do We Stand and Where Are We Going?

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Abstract

In this overview, an attempt is made to assess the present and future research and development in thermal plasma processing of materials restricted to (1) thermal plasma coating technologies, (2) thermal plasma synthesis of fine powders, (3) thermal plasma waste destruction, and (4) thermal plasma spheroidization and densification. Since thermal plasma processing is, in general, governed by a large number of parameters, implementation of controls becomes mandatory. The lack of sufficient controls combined with economic drawbacks in some cases has been the main obstacle for the growth of thermal plasma technology. Present R&D efforts, however, address these problems.

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  1. Department of Mechanical Engineering and ERC for Plasma-Aided Manufacturing, University of Minnesota, Minneapolis, Minnesota, 55455

    E. Pfender

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Pfender, E. Thermal Plasma Technology: Where Do We Stand and Where Are We Going?. Plasma Chemistry and Plasma Processing 19, 1–31 (1999). https://doi.org/10.1023/A:1021899731587

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