Issue 37, 2023

Investigating the influence of substituent groups in TTM based radicals for the excitation process: a theoretical study

Abstract

Tri-(2,4,6-trichlorophenyl)methyl (TTM) based radicals can be promising in providing relatively high fluorescence quantum efficiency. In this study, we have evaluated the photoluminescence properties of a series of TTM-based radicals by means of DFT and TD-DFT methods. The optimized structures of the ground states (D0) and the first excited states (D1) of all the radicals are calculated and the computed emission bands are comparable with previous experimental results. knr is determined from transition dipole moments (μ12) and the energy gaps between D0 and D1E), both of which can be regulated by the conjugated structures from the substituent groups. knr was derived from the mode-averaging method and is consistent with the experimental results. Factors influencing kr and knr, including the potential energy differences (ΔG0), the vibrational reorganization energies (λ) and the electron coupling term (Hab), are discussed. By comparing kr and knr in solvents with different polarities (cyclohexane, toluene, and chloroform), TTM based radicals in cyclohexane exhibit the most promising fluorescence efficiencies. Besides, two substituted radicals, namely 2Br-TTM-3PCz and 2F-TTM-3PCz, have been fabricated. The results show that fluorine atoms are able to increase ΔG0 and a considerably small knr has been predicted. We expect that our calculation can benefit the design of light-emitting molecules in further experiments.

Graphical abstract: Investigating the influence of substituent groups in TTM based radicals for the excitation process: a theoretical study

Supplementary files

Article information

Article type
Paper
Submitted
20 Mar 2023
Accepted
25 Aug 2023
First published
01 Sep 2023

Phys. Chem. Chem. Phys., 2023,25, 25871-25879

Investigating the influence of substituent groups in TTM based radicals for the excitation process: a theoretical study

L. Fei, J. Wang, F. Bai, S. Wang, B. Hu, C. Kong and H. Zhang, Phys. Chem. Chem. Phys., 2023, 25, 25871 DOI: 10.1039/D3CP01248D

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