A monolayer dispersion study of titania-supported copper oxide

Xiao-Feng Yu; Nian-Zu Wu; You-Chang Xie; You-Qi Tang

doi:10.1039/A909893C

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Xiao-Feng Yu,*^a Nian-Zu Wu,^a You-Chang Xie^a and You-Qi Tang^a

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* Corresponding authors

^a State Key Laboratory for Structural Chemistry of Unstable Stable Species, Institute of Physical Chemistry, Peking University, Beijing, China
E-mail: xiaofeng@pubms.pku.edu.cn
Fax: +86-10-62751725
Tel: +86-10-62751491

Abstract

A monolayer dispersion of copper oxide on the surface of anatase and its effect on the anatase properties have been studied by BET surface area measurements, transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), temperature-programmed reduction (TPR), and X-ray diffraction (XRD). XPS results give a monolayer dispersion threshold of 5.1 mg CuO (g TiO₂)⁻¹. Strong interactions between CuO and anatase can be seen from the TPR results. When the loading of CuO is below its monolayer dispersion threshold, the onset temperature of the anatase–rutile transformation and the transition speed strongly depend on the dispersion of CuO. Crystalline CuO appears when the CuO loading is higher than the monolayer dispersion threshold, but it has little effect on the phase transformation of the samples.

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Article information

DOI: https://doi.org/10.1039/A909893C
Article type: Paper
Submitted: 16 Dec 1999
Accepted: 11 Apr 2000
First published: 21 Jun 2000

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J. Mater. Chem., 2000,10, 1629-1634

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