Issue 19, 2002
From the journal:

Physical Chemistry Chemical Physics

Investigations on the stability of thiol stabilized semiconductor nanoparticles

Herwig Döllefeld,a   Kathrin Hoppe,a   Joanna Kolny,a   Kristian Schilling,b   Horst Wellera  and  Alexander Eychmüller*a  

* Corresponding authors

a Institute of Physical Chemistry, University of Hamburg, Bundesstraße 45, Hamburg, Germany
E-mail: eychmuel@chemie.uni-hamburg.de

b Nanolytics Gesellschaft für Kolloidanalytik mbH, Hauptstr. 20, Dallgow b. Berlin, Germany

Abstract

Various analytical methods like analytical ultracentrifugation, UV–vis absorption spectroscopy, NMR spectroscopy, and powder X-ray diffraction have been applied to study the stability of thiol stabilized semiconductor nanoparticles. Reduced particle sizes were found in solution at low concentrations. Most probably the assumed covalently bound thiols desorb from the surface of the particles, leaving behind vulnerable unstabilized particles that might even undergo continuous decay over time. Additionally, breaking of the intra ligand S–C bond could be demonstrated, presenting a cadmium sulfide particle synthesis introducing sulfur only by the ligands without any additional sulfide ions.

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Article information

DOI
https://doi.org/10.1039/B202101C
Article type
Paper
Submitted
28 Feb 2002
Accepted
24 Jul 2002
First published
02 Sep 2002

Phys. Chem. Chem. Phys., 2002,4, 4747-4753

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Investigations on the stability of thiol stabilized semiconductor nanoparticles

H. Döllefeld, K. Hoppe, J. Kolny, K. Schilling, H. Weller and A. Eychmüller, Phys. Chem. Chem. Phys., 2002, 4, 4747 DOI: 10.1039/B202101C

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