Issue 4, 2015
From the journal:

New Journal of Chemistry

Generation of graphene quantum dots by the oxidative cleavage of graphene oxide using the oxone oxidant†

Yonghun Shin,a   Jintaek Park,a   Daesun Hyun,a   Junghee Yanga  and  Hyoyoung Lee*ab  

* Corresponding authors

a Center for Smart Molecular Memory, Department of Chemistry and Department of Energy Science, Sungkyunkwan University, 2066 Seoburo, Jangan-gu, Suwon, Gyeonggi-do 440-746, Republic of Korea

b Samsung-SKKU Graphene Center, SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, 2066 Seoburo, Jangan-gu, Suwon, Gyeonggi-do 440-746, Republic of Korea
E-mail: hyoyoung@skku.edu

Abstract

A novel and facile method to synthesize graphene quantum dots (GQDs) from graphene oxide (GO) via sonication or UV-irradiation reaction using an acid-free oxone oxidant (potassium monopersulfate) that does not require a neutralization process with a strong base was developed. Our novel sono- and photo-oxidation approach yielded high quality GQDs after simple purification. GO sheets treated by sono- and photo-oxidation with the oxone oxidant as the free radical source broke in multiple places for efficient generation of GQDs. Sono-oxidation is a simpler and more facile method than photo-oxidation in terms of mass production and the strong fluorescence properties of the resulting GQDs. Facile synthesis by sono- and photo-oxidation represents a new route to prepare GQDs from GO in organic solvent.

Graphical abstract: Generation of graphene quantum dots by the oxidative cleavage of graphene oxide using the oxone oxidant

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C4NJ02299H
Article type
Letter
Submitted
13 Dec 2014
Accepted
04 Feb 2015
First published
05 Feb 2015

New J. Chem., 2015,39, 2425-2428

Author version available

Download author version (PDF)

Permissions

Request permissions

Generation of graphene quantum dots by the oxidative cleavage of graphene oxide using the oxone oxidant

Y. Shin, J. Park, D. Hyun, J. Yang and H. Lee, New J. Chem., 2015, 39, 2425 DOI: 10.1039/C4NJ02299H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements