Issue 107, 2014
From the journal:

RSC Advances

Electrochemical role of oxygen containing functional groups on activated carbon electrode†

Tomohiro Tojo,a   Kengo Sakurai,b   Hiroyuki Muramatsu,b   Takuya Hayashi,b   Kap-Seung Yang,c   Yong Chae Jung,d   Cheol-Min Yang,d   Morinobu Endoe  and  Yoong Ahm Kim*c  

* Corresponding authors

a Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580, Japan

b Faculty of Engineering, Shinshu University, 4-17-1 Wakasato, Nagano 380-8553, Japan

c School of Polymer Science and Engineering, Chonnam National University, 77 Yongbong-ro, Buk-gu, Gwangju 500-757, Republic of Korea
E-mail: yak@jnu.ac.kr
Fax: +82-62-530-1871
Tel: +82-62-530-1779

d Institute of Advanced Composite Materials, Korea Institute of Science and Technology (KIST), Chudongro 92, Bongdong-eup, Wanju-gun, Jeonbuk 565-905, Republic of Korea

e Carbon Institute of Science and Technology, Shinshu University, 4-17-1 Wakasato, Nagano 380-8553, Japan

Abstract

We have experimentally and theoretically clarified the effect of oxygen functional groups on the capacitive performance of a photochemically treated activated carbon electrode. A high density of C[double bond, length as m-dash]O groups at the mouth of the micropores, where the chemically active edge sites are predominantly available, increases the energy barrier for ions to enter the pores, thereby resulting in a large decrease in the specific capacitance.

Graphical abstract: Electrochemical role of oxygen containing functional groups on activated carbon electrode

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Article information

DOI
https://doi.org/10.1039/C4RA10439K
Article type
Communication
Submitted
15 Sep 2014
Accepted
10 Nov 2014
First published
14 Nov 2014

RSC Adv., 2014,4, 62678-62683

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Electrochemical role of oxygen containing functional groups on activated carbon electrode

T. Tojo, K. Sakurai, H. Muramatsu, T. Hayashi, K. Yang, Y. C. Jung, C. Yang, M. Endo and Y. A. Kim, RSC Adv., 2014, 4, 62678 DOI: 10.1039/C4RA10439K

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