Issue 90, 2016, Issue in Progress

Ultra-low dielectric constant materials with hydrophobic property derived from polyhedral oligomeric silsequioxane (POSS) and perfluoro-aromatics

Abstract

A series of poly(arylene ether)s were synthesized with a diphenol POSS (2OH-DDSQ) and perfluoro-aromatics including decafluorobiphenyl, decaflurobenzophenone and decafluorodiphenyl sulfone via a two-step nucleophilic aromatic substitution polymerization. The chemical structures of the polymers were confirmed by 19F-NMR and 1H-NMR. All the polymers exhibit not only low dielectric constants in the range of 1.85–2.37 at 1 MHz at room temperature but also low dielectric losses, hydrophobic properties, low water uptake and good thermal properties. In particular, the DDSQ-DFPK film showed the ultra-low dielectric constant of 1.83 at 1 MHz. With increasing polarity of the perfluoro-aromatics, the water contact angles decrease from 108° to 102°.

Graphical abstract: Ultra-low dielectric constant materials with hydrophobic property derived from polyhedral oligomeric silsequioxane (POSS) and perfluoro-aromatics

Article information

Article type
Paper
Submitted
08 Jul 2016
Accepted
02 Sep 2016
First published
05 Sep 2016

RSC Adv., 2016,6, 87433-87439

Ultra-low dielectric constant materials with hydrophobic property derived from polyhedral oligomeric silsequioxane (POSS) and perfluoro-aromatics

J. Hao, Y. Wei and J. Mu, RSC Adv., 2016, 6, 87433 DOI: 10.1039/C6RA17499J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements