N-Doping of plasma exfoliated graphene oxide via dielectric barrier discharge plasma treatment for the oxygen reduction reaction

Yiqing Wang; Feng Yu; Mingyuan Zhu; Cunhua Ma; Dan Zhao; Chao Wang; Amin Zhou; Bin Dai; Junyi Ji; Xuhong Guo

doi:10.1039/C7TA08607E

N-Doping of plasma exfoliated graphene oxide via dielectric barrier discharge plasma treatment for the oxygen reduction reaction

Yiqing Wang,^a Feng Yu,

*^a Mingyuan Zhu,^a Cunhua Ma,^a Dan Zhao,^a Chao Wang,^a Amin Zhou,^a Bin Dai,^a Junyi Ji

*^b and Xuhong Guo

*^ac

Author affiliations

* Corresponding authors

^a Key Laboratory for Green Processing of Chemical Engineering of Xinjiang Bingtuan, School of Chemistry and Chemical Engineering, Shihezi University, Shihezi 832003, P. R. China
E-mail: yufeng05@mail.ipc.ac.cn

^b College of Chemical Engineering, Sichuan University, Chengdu, Sichuan 610065, P. R. China
E-mail: junyiji@scu.edu.cn

^c State Key Laboratory of Chemical Engineering, East China University of Science and Technology, Shanghai 200237, P. R. China
E-mail: guoxuhong@ecust.edu.cn

Abstract

Nitrogen doped plasma exfoliated graphene oxide (N-PEGO) was obtained by fast and effective dielectric barrier discharge (DBD) plasma technology. The plasma treatment could provide a burst open and high-energy electron/ion collision mechanism for doping and exfoliation. Ammonium carbonate was previously inserted into the interlayer of GO powder, and the rapid release of the NH₃ and CO₂ gases during DBD plasma treatment could exfoliate the GO powder into few-layer PEGO (<4 layers). Moreover, the plasma treatment also introduced the nitrogen dopant (5.26 at%), which is proven to be an efficient strategy to enhance the performance of oxygen reduction reaction (ORR) electrocatalysts. The resulting N-PEGO showed a high onset potential comparable to that of commercial Pt/C, i.e., 0.89 V vs. reversible hydrogen electrode (RHE) and good electrocatalysis stability towards the ORR. This fast and effective one-step doping and exfoliation strategy demonstrated a new industrial-scale N-doped graphene fabrication technique.

Journal of Materials Chemistry A

N-Doping of plasma exfoliated graphene oxide via dielectric barrier discharge plasma treatment for the oxygen reduction reaction

Abstract

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N-Doping of plasma exfoliated graphene oxide via dielectric barrier discharge plasma treatment for the oxygen reduction reaction

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