Issue 11, 2013

Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

Abstract

Block copolymers with metals confined in one or more blocks are emerging as candidate materials for nanomanufacturing applications due to their unprecedented nanoscale pattern transfer capabilities. In this article we highlight recent developments in metal-containing block copolymers in terms of their novel synthetic methodologies with particular emphasis on sequential infiltration synthesis, their hierarchical self-assembly from nano, meso, and submicron scales, and their applications as an etch mask for high-throughput, high-aspect-ratio nano and meso scale patterning.

Graphical abstract: Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

Article information

Article type
Highlight
Submitted
25 Dec 2012
Accepted
21 Jan 2013
First published
21 Jan 2013

J. Mater. Chem. C, 2013,1, 2080-2091

Emerging trends in metal-containing block copolymers: synthesis, self-assembly, and nanomanufacturing applications

M. Ramanathan, Y. Tseng, K. Ariga and S. B. Darling, J. Mater. Chem. C, 2013, 1, 2080 DOI: 10.1039/C3TC00930K

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