Abstract
Well-crystallized LaNiO3 (LNO) thin films were grown on thermally oxidized silicon (SiO2/Si) and SrTiO3 substrates by a simple chemical solution deposition (CSD) technique. The LNO thin films obtained had pseudocubic phase without the existence of impurity phase. The LNO films on SiO2/Si substrates were polycrystalline, dense, and randomly oriented with a uniform surface and cross-section, whereas those on SrTiO3 substrates were (100) highly oriented with uniform grain size. The room temperature resistivity of the films on SiO2/Si substrates annealed at 750°C was about 0.54 mΩ cm, which is much lower than that of the films derived by the water-based solution technique. The subsequent deposition and electrical measurements of PbTiO3, (Pb,La)TiO3, Pb(Zr,Ti)O3 thin films on the CSD derived LNO/SiO2/Si confirmed the LNO films to be promising electrode materials for ferroelectric thin films.
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